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알루미늄 chip 의 용해시 산화피막 제거에 미치는 Flux 혼합물의 영향
송상우,김정호,김경민,김정식,윤의박 ( Sang Woo Song,Jeong Ho Kim,Kyoung Min Kim,Jung Sik Kim,Eui Pak Yoon ) 한국주조공학회 1998 한국주조공학회지 Vol.18 No.1
N/A Aluminum alloy forms rapidly a layer of oxide on surfaces exposed to an oxygen-containing atmosphere and absorbs hydrogen gas by reaction with water vapor. Oxidation accelerates as time and temperature increase. Also hydrogen content increase with time and temperature. In this experiment, A356.2 aluminum chip was used. The ability of oxidation protection of covering fluxes and oxide removal ability of flux additives were evaluated. Recovery and hydrogen content of Al melt was measured with various NaCl/KCl ratio. And recovery was measured with various flux additives such as chlorides and fluorides. The optimal ratio of NaCl/KCl for protection of oxidation was 5:5. Fluorides were more effective in removal of oxide than chlorides. (Received July 23, 1997)