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유동현(Donghyun Yu),안영기(Youngki Ahn),안덕민(Dukmin Ahn),김태성(Taesung Kim),이희명(Heemyoung Lee),김정인(Jeongin Kim),이양래(Yanglae Lee),김현세(Hyunse Kim),임의수(Euisu Lim) 대한기계학회 2008 대한기계학회 춘추학술대회 Vol.2008 No.11
As the minimum feature size decreases, techniques to avoid contamination and processes to maintain clean wafer surfaces have become very important. The deposition and detachment of nanoparticles from surfaces are major problem to integrated circuit fabrication. Therefore, cleaning technology which reduces nanoparticles is essential to increase yield. Previous megasonic cleaning technology has reached the limits to reduce nanoparticles. Megasonic cleaning is one of the efficiency method to reduce contamination nanoparticle. Two major mechanisms are active in a megasonic cleaning, namely, acoustic streaming and cavitation. Acoustic streaming does not lead to sufficiently strong force to cause damage to the substrates or patterns. Sonoluminescence is a phenomenon of light emission associated with the cavitation of a bubble under ultrasound. We studied a correlation between sonoluminescence and sound pressure distribution for the minimum of pattern damage in megasonic cleaning.