http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
정전 탐침법과 유체시뮬레이션을 이용한 DC플라즈마 특성 연구
손의정(Eui-Jeong Son),김동현(Dong-Hyun Kim),이호준(Ho-Jun Lee) 대한전기학회 2014 전기학회논문지 Vol.63 No.10
Using a parallel plate DC plasma system was prepared. Using this equipment, we investigated the basic discharge characteristics of DC argon plasma in terms of electron density, temperature, voltage and current waveforms and plasma potential. The effects of the electrode gap distance, input voltage, ballast resistance and pressure were measured using electrostatic probe. Plasma simulation using fluid approximation has been performed. External circuit effects was included in the simulation. Measured and calculated current voltage characteristics show similar tendencies.
Cutoff Probe를 이용한 자화유도결합 플라즈마의 특성 연구
손의정(Eui-Jeong Son),김동현(Dong-Hyun Kim),이호준(Ho-Jun Lee) 대한전기학회 2016 전기학회논문지 Vol.65 No.10
Electromagnetic wave simulation was performed to predict characteristics of manufactured cutoff probe at low temperature magnetized plasma medium. Microwave cutoff probe is designed for research the properties of magnetized inductively coupled plasma. It was shown that the cutoff probe method can safely be used for weakly magnetized high density plasma sources. Cutoff probe system with two port network analyzer has been prepared and applied to measure electron density distributions in large area, 13.56㎒ driven weakly magnetized inductively coupled plasma source. The results shown that, the plasma frequency confirmed cut-off characteristics in low temperature plasma. Especially, cut-off characteristics was found at upper hybrid resonance frequency in the environment of the magnetic field. In case of a induced weak magnetic field in inductively coupled plasma, plasma density estimated from the cutoff frequency in the same way at unmagnetized plasma due to nearly same plasma frequency and upper hybrid resonance frequency. The plasma density is increased and uniformity is improved by applying a induced weak magnetic field in inductively coupled plasma.
유체시뮬레이션을 통한 Ar/CF₄ 자화유도결합 플라즈마의 특성 연구
김윤기(Yun-Gi Kim),손의정(Eui-Jeong Son),위성석(Sung-Suk Wi),김동현(Dong-Hyun Kim),이호준(Ho-Jun Lee) 대한전기학회 2015 전기학회논문지 Vol.64 No.4
The self-consistent simulation based on the drift-diffusion approximation with anisotropic transport coefficients was performed. The RHCP-wave propagation was observed in MICP and this wave was refracted toward the high-density region. The calculated impedance seen from the antenna terminal shows that resistance component of MICP is a higher than that of ordinary ICP. Because of a higher resistance, the power transfer efficiency was improved to 95%. This property is practically important for large-size, low-pressure plasma sources because high resistance corresponds to high power-transfer efficiency and stable impedance matching characteristics.