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박희중,고승희,이관우,이재갑 대한금속·재료학회 2008 ELECTRONIC MATERIALS LETTERS Vol.4 No.4
A simple process to achieve the selective chemical vapor deposition of Cu on octadecyltrichlorosilane (OTS)- patterned indium tin oxide (ITO) substrates has been realized in this study. A microcontact printing method was employed to transfer the OTS patterns on the ITO surfaces and subsequently a Cu thin film was selectively deposited onto the OTS-free ITO surface areas by metal organic chemical vapor deposition (MOCVD). The selectively formed Cu on the pre-patterned ITO substrates resulted in the Transmission Line Model (TLM) test patterns, giving the low specific contact resistance of Cu-ITO interfaces