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허성보 ( Sung Bo Heo ),김소영 ( So Young Kim ),김승홍 ( Seung Hong Kim ),김선경 ( Sun Kyung Kim ),김유섬 ( Yu Sung Kim ),김대일 ( Dae Ii Kim ) 한국열처리공학회 2013 熱處理工學會誌 Vol.26 No.2
Abstrart ITO thin films deposited on glass substrate with RF magnetron sputtenng were vacuum annealed at 100, 200 and 300°C for 30 minutes and then effect of annealing temperature on the structural, electrical and optical properties of ITO films were investigated. The structural properties are strongly related to annealing temperature. The annealed films above 100°C are grown as a hexagonal wurtzite phase and the largest grain size is observed in the films annealed at 300°C. The electrical resistivity also decreases as low as 4.65 x I 0 0cm with a increase in annealing temperature and ITO film annealed at 300°C shows the lowest sheet resistance of 43.6 01 fl. The optical transmittance in a visible wavelength region also depends on the annealing temperature. The films annealed at 300°C show higher transmittance of 80.6% than those of the films prepared in this study.