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일반 현미경용 유리에 증착시킨 Indium - Tin Oxide 박막의 제작 및 특성
김여중(Y. J. Kim),조길호(K. H. Cho) 한국진공학회(ASCT) 2000 Applied Science and Convergence Technology Vol.9 No.1
상용 유리 기판 위에 rf-magnetron 스퍼터링을 이용하여 Indium-Tin Oxide(ITO) 박막을 증착시켰다. 기판의 온도는 300℃ 및 500℃, 산소 분압을 2, 3, 5%로하여 두께 2,000~2,400 Å이 되도록 증착시킨 ITO 박막의 특성을 Spectrophotometer, XRD, SEM, AFM 및 4-point probe, Hall effect 측정장치을 이용하여 분석하였다. 최적의 증착 조건은 기판 온도 500℃, 산소 분압 2~3%이었다. 이때 ITO 박막은 투과도 91%, 비저항 5.4×10^(-3)Ω㎝, 전하농도 l.0×10^(19) ㎝-³, 전하 이동도 150㎠/Vsec를 나타내었다. 또한 박막의 결정성은 (400) 및 (222) 방향이 주종을 이루었다. 기판을 사전 열처리 벚 화학 세척을 하지않고 단순히 초음파 세척만을 해 주었을 때, 투과도는 86%, 전하농도는 5.4×10^(19) ㎝-³, 전하이동도는 24 ㎠/Vsec인 ITO 박막을 얻을수 있었다. Indium-Tin Oxide (ITO) thin films were deposited on the commercial glass substrate by rf-magnetron sputtering. The ITO films with the thickness of 2,000~2,400 Å were prepared by changing the oxygen partial pressures of 2, 3, and 5%, as well as by changing the substrate temperature of 300℃ and 500℃. Spectrophotometer, XRD, SEM, AFM, 4-point probe and Hall effect system were employed to characterize the ITO films. The optimum deposition conditions were the substrate temperature of 500℃ and oxygen partial pressure of 2-3%. At these conditions, the ITO film showed the transmittance of 91%, the resistivity of 5.4×10^(-3) Ω-㎝, the carrier concentration of 10×10^(19)㎝-³, and the carrier mobility of 150 ㎠/Vsec. In XRD spectra, the (222) and (400) In₂O₃ planes were dominant under the optimum deposition conditions. When the substrate was cleaned only by the method of ultrasonic cleaning without both pre-annealing and chemical treatment of the substrate, the ITO film exhibited the transmittance of 86%, the carrier concentration of 5.4×10^(19)㎝-³ and the mobility of 24 ㎠/Vsec.
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Plasma-PVD법에 의해 제작한 Zn-Mg합금 박막의 특성 분석
이경희(K. H. Lee),배일용(I. Y. Bae),김여중(Y. J. Kim),문경만(K. M. Moon),이명훈(M. H. Lee) 한국마린엔지니어링학회 2005 한국마린엔지니어링학회 학술대회 논문집 Vol.2005 No.-
(100-x)ZnㆍMg alloy films are prepared onto cold-rolled steel substrates; where x ranged from 0 to about 38 atomic %. The alloy films show microcrystalline and grain structures respectively, according to preparation conditions such as composition ratio of zinc and magnesium or gas pressures etc.. And X-ray diffraction analysis indicates not only the presence of Zn-Mg thin films with forced solid solution but also the one of MgZn₂ alloy films partly. In addition the influence of Mg/Zn composition ratio and morphology of the Zn-Mg alloy films on corrosion behavior is evaluated by electro-chemical anodic polarization tests in deaerated 3% NaCl solution. From this experimental results, all the prepared Zn-Mg alloy films showed obviously good corrosion resistance to compare with 99.99% Zn and 99.99% Mg Ingots for evaporation metal. It is thought that the Zn-Mg films with effective forced solid solution prepared by plasma enhanced PVD method, produces smaller and denser grain structure so that may improve the formation of homogeneous passive layer in corrosion environment.
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