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안테나에서 페라이트 위치 변화에 따른 전자계 시뮬레이션과 전기적ㆍ광학적 특성
李主?(Joo-Ho Lee),梁種璟(Jong-Kyung Yang),李鐘燦(Jong-Chan Lee),崔明鉉(Myung-Hyun Choi),金炳澤(Byung-Tack Kim),朴大熙(Dae-Hee Park) 대한전기학회 2008 전기학회논문지 Vol.57 No.5
The RF inductive discharge of inductively couples plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technology. Although most practical ICPs operate at 13.56 [MHz] and 2.65 [MHz], the trend to reduce the operating frequency is clearly recognizable from recent ICP developments. In an electrodeless fluorescent lamp, the use of a lower operating frequency simplifies and reduces cost of RF matching systems and RF generators and can eliminate capacitive coupling between the inductor coil and plasma, which could be a strong factor in wall erosion and plasma contamination. In this study, We discussed simulation and experimental results when changing ferrite position in antenna.