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RISS 인기검색어
- 검색키워드
- 저자 : Ryazanov, Mikhail (검색결과 2 건)
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Photodissociation Dynamics of the Thiophenoxy Radical at 248, 193, and 157 nm
Harrison, Aaron W.,Lim, Jeong Sik,Ryazanov, Mikhail,Wang, Gregory,Gao, Shumin,Neumark, Daniel M. American Chemical Society 2013 The journal of physical chemistry. A, Molecules, s Vol.117 No.46
<P>The photodissociation dynamics of the thiophenoxy radical (C<SUB>6</SUB>H<SUB>5</SUB>S) have been investigated using fast beam coincidence translational spectroscopy. Thiophenoxy radicals were produced by photodetachment of the thiophenoxide anion followed by photodissociation at 248 nm (5.0 eV), 193 nm (6.4 eV), and 157 nm (7.9 eV). Experimental results indicate two major competing dissociation channels leading to SH + C<SUB>6</SUB>H<SUB>4</SUB> (o-benzyne) and CS + C<SUB>5</SUB>H<SUB>5</SUB> (cyclopentadienyl) with a minor contribution of S + C<SUB>6</SUB>H<SUB>5</SUB> (phenyl). Photofragment mass distributions and translational energy distributions were measured at each dissociation wavelength. Transition states and minima for each reaction pathway were calculated using density functional theory to facilitate experimental interpretation. The proposed dissociation mechanism involves internal conversion from the initially prepared electronic excited state to the ground electronic state followed by statistical dissociation. Calculations show that SH loss involves a single isomerization step followed by simple bond fission. For both SH and S loss, C–S bond cleavage proceeds without an exit barrier. By contrast, the CS loss pathway entails multiple transition states and minima as it undergoes five membered ring formation and presents a small barrier with respect to products. The calculated reaction pathway is consistent with the experimental translational energy distributions in which the CS loss channel has a broader distribution peaking farther away from zero than the corresponding distributions for SH loss.</P><P><B>Graphic Abstract</B> <IMG SRC='http://pubs.acs.org/appl/literatum/publisher/achs/journals/content/jpcafh/2013/jpcafh.2013.117.issue-46/jp403229h/production/images/medium/jp-2013-03229h_0008.gif'></P><P><A href='http://pubs.acs.org/doi/suppl/10.1021/jp403229h'>ACS Electronic Supporting Info</A></P>
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Efficient removal of the carbon deposits formed during the mixed methane reforming over Ni/Al2O3
Oleksandr Shtyka,Mateusz Zakrzewski,Radoslaw Ciesielski,Adam Kedziora,Sergey Dubkov,Roman Ryazanov,Malgorzata Szynkowska,Tomasz Maniecki 한국화학공학회 2020 Korean Journal of Chemical Engineering Vol.37 No.2
This work investigates the process of elimination of carbon deposits formed during the mixed reforming of methane mixture. The mixed reforming of methane to synthesis gas was studied over Ni/Al2O3 catalyst in the 650- 750 oC. The amount of carbon deposit on the surface of catalyst varied from 2.8 to 5.9%, depending on the reaction temperature. The reactivity of carbon species was evaluated in the oxygen, hydrogen, carbon dioxide, and water mixtures. The obtained results revealed the presence of highly active carbon form (etched at a temperature below 200 oC) and inactive form (gasification at a temperature above 500 oC). The SEM and Raman analyses confirmed the presence of carbon in the form of filaments. Among all investigated gasification agents, water vapor was found to be the most efficient in removing the carbon deposit due to better adsorption of water on the surface of aluminum oxide. The overall mechanism of mixed methane reforming along with carbon gasification was shown.
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