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Deposition and evaluation of MoNx films deposited by magnetron sputtering
Yajun Ma,Shenghua Li,Yuansheng Jin,Guoshun Pan,Yucong Wang,Simon C. Tung 한국트라이볼로지학회 2002 한국트라이볼로지학회 학술대회 Vol.2002 No.10
Molybdenum Nitrided (MoNx) films were deposited by DC planar magnetron sputtering. Silicon wafers and real nitrided stainless steel piston rings are employed as substrates. 12 different combinations of nitrogen and argon partial pressure, from 1:7 to 7:1, were applied to deposit MoNx films. X-ray diffraction (XRD) was used to determine the phase structures of films. When nitrogen vs. argon partial pressure is 1:7, the film is mainly MO₂N phase. With increase of nitrogen partial pressure, MoN phase emerges, but MO₂N phase still exists. Composition analysis with atomic emission spectrometry (AES) also agreed with this. The films have very high nanohardness (max 2400Hv) and good adhesion to the substrates.