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SiH_2Cl_2/SiH_4 혼합가스를 사용하여 유도결합형 플라즈마 증착법으로 제작된 다결정 실리콘 박막의 제조 연구
문병연,손정식 경운대학교 산업기술연구소 2000 産業技術硏究論文誌 Vol.3 No.1(A)
Polycrystalline silicon thin film have been deposited by an inductively coupled plasma chemical vapor deposition using SiH₂Cl₂/SiH₄/H₂ mixtures. The ICP source offers some advantages which include high electron density, simple design, good uniformity and lower ion bombardment on the growing surface. The poly-Si quality and deposition rate can be improved significantly by adding SiH₂Cl₂ into SiH₄ plasma. But an optimum flow rate ratio of SiH₂Cl₂to SiH₄seems to be ∼1. The Cl radicals appear to enhance the etching effect and promote the growth of crystalline phase. When both SiH₂Cl₂ and SiH₄ were used as the source gas, the deposition rate had a maximum value of 7.2 A˚/sec. The poly-Si film exhibited the volume fraction from Raman scattering of 87% and the SEM average grain size of ∼3000 A˚
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ZnSe/GaAs 이종접합 구조의 photoreflectance 연구
손정식,문병연 경운대학교 산업기술연구소 2002 産業技術硏究論文誌 Vol.5 No.1(A)
We have studied the interface characteristics of undoped ZnSe/GaAs heterostructure, resulting from the strain between ZnSe and GaAs, using photoreflectance (PR) spectroscopy. For PR spectra measured at room temperature, the two peaks were observed at about 1.4 eV GaAs bandgap region originating from ZnSe/GaAs and GaAs/SI-GaAs interfaces and the shoulder peak was observed at about 2.7 eV ZnSe bandgap region originating from the separation between heavy hole and light hole. we could be determined the origin of two different features observed in the PR spectra by combining in-phase and out-phase measurements of Lock-in amplifier. From PR result, we knew that ZnSe epilayer was partially relaxed due to thick layer thickness over than the critical layer thickness (CLT) and the stress effect caused by these layer relaxation affected the ZnSe/GaAs heterointerface more than the interface of GaAs buffer/SI-GaAs substrate.
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손정식,문병연 경운대학교 산업기술연구소 2000 産業技術硏究論文誌 Vol.3 No.1(A)
We have investigated the AnSe thin-film properties with growth temperature. The ZnSe thin-film samples were grown on GaAs substrates by molecular beam epitaxy system. The grown samples were characterized by double crystal X-ray diffractometry and photoluminescence. As increasing growth temperature, the grown ZnSe thin-film thickness was decreased with -1.5 nm/hr℃ by re-evaporation of An and Se molecules on the surface. From the result of photoluminescence measurements, the emission intensity ratio of I₂/X_hh peak was increased, which was explained in terms of the increased density of donor impurity from the Ga inter-diffusion at the interface.
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신병록,윤건식 국립7개대학공동논문집간행위원회 2005 공업기술연구 Vol.5 No.-
이 논문에서는 캐비테션을 동반하는 기-액 2상유동의 해석을 휘한 수치해법을 제안한다. 본 수치해법에서는, 기-액 2상유동 특유의 압축성 및 비압축성 유동의 성격을 동시에 처리하기 위하여, 밀도를 기본으로하는 운동방정식을 전처리(preconditioning)하고, 계산노력의 향상을 위하여 다각화, 유속차 분리 및 MUSCL-TVD해법이 이용되었고, Runge-Kutta 차분해법으로 시간 적분하였다. 전처리 방법에 기-액 2상유동을 국소균질 개념의 단상매체 균질모델을 도입하므로서, 파동의 전파, 급격한 밀도변화, 낮은 마하수에서의 비압축성 유동성격등 이른바 캐비테션유동의 해석을 안정하고 용이하게 한다. 본 수치해법을 이용하여 캐비테션을 동반하지 않는 단상유동과 캐비테션 기-액 2상유동을 해석하고, 해법의 타당성과 유효성을 검토한다.
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宋秉軾 제주대학교 1986 논문집 Vol.22 No.2
Everyone is concerned with human behavior. The formal organization, of course, is the most important situational environment for the study of organizational behavior. Viewing the organization as a system, there are subsystems that are expecially important to the study of organizational behavior Understanding why people work is the domain of work motivation. To clarify what is meant by motivation let us start with an observed behavior and work backwards to possible causes of it Two general classes of explanatory concepts usually are used to describe behaviors such as this The first is ability The abilities represent certain minimum conditions necessary for completion of the work in a sense, we can think of them as the "can do" factors associated with the behavior The second set of explanatory concepts for the behavior often is labeled motivation Motivation is the individual's disire to show the behavior and might be thought of as the "will do" factors influencing the display of work-related behaviors Knowing that a teller can perform arithmetic operations flawlessly and can operate the machines by no means ensures that that teller will perform as well as the one in our example He or she must want to perform accurately and efficiently and direct his or her effort toward doing a good job As the number of human problems facing management began to mount, the limitations of traditional human relations approach to motivation began to surface. Starting around the beginning of the 1960s, those concerned with work motivation started to search earnestly for a new theoretical foundation and to attempt to devise new techniques for application in particular, humanistic psychologist Abram Maslow's hierarchy of needs was adapted to work motivation. Next came the two-factor theory of Frederick Herzberg instead of Maslow's five levels, Herzberg felt there were only two factors. hygiene/maintenance factors, and motivatiors. Most recently, Clayton Alderfer reorganized the Maslow hierarchy into three groups of core needs: existence, relatedness and growth (thus called the ERG model) Because of the lack of research for the content approaches, Victor Vroom proposed an alternative theory of work motivation, based on expectancy. Since Vroom, there have been refinements of expectancy model (by Porter and Lawler, and Lawler) and considerable interest in a related cognitive process approahe called equity theory. Recently attention has focused on the potential contribution that attribution theory and locus of control can make to work motivation Next came the human relations movement, and then the content models of Maslow, Herzberg, Alderfer, and McClelland More recent developments have come from process models Most work has been done on expectancy-based process models, but recently, equity and attributin theories have received attention Thes process models are cognitively based ; there are other cognitive models that exist in psychology. but equity and attribution are the ones that have had the greatest influence on work motivation so for. At present a group of content models can be identified and a group of process models can be identified, but an overall theory of work motivation does not exist
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