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김용우(Yong-Woo Kim),최수창(Soo-Chang),박정우(Jeong-Woo Park),이재종(Jae-Jong Lee),이득우(Deug-Woo Lee) 한국기계가공학회 2008 한국기계가공학회 춘추계학술대회 논문집 Vol.2008 No.-
Currently, piezoelectric actuators which have attractive features such as high output force, high positioning resolution, high stiffness and quick response have been used in many ultra precision stages. An amplifier is needed for PZT to move minutely. This paper presents a nano PZT amplifier which can control motion of PZT stage minutely. New designed amplifier has benefit that is high response, low noise level, and low cost. We designed circuit of amplifier and investigated the characteristics of the PZT amplifier.
이승준(Seung-Jun Lee),김용우(Yong-Woo Kim),김귀순(Kui-Soon Kim),이득우(Deug-Woo Lee),한명철(Myung-Chul),이종열(Jong-Ryul Lee) 한국기계가공학회 2007 한국기계가공학회 춘추계학술대회 논문집 Vol.2007 No.-
Dental air turbine hand pieces are manufactured with a wide range of alternative design features which may influence their suitability for particular clinical procedures. The leading industry nations have been devloped design technology and manufacturing technology from 19th century. In this article the passibility of the manufacturing of air turbine hand pieces composed of very small sized parts is presented.
Surface Topography on Silicon by AFM-based Nanomachining using PCD Tip
Jeong Woo Park(박정우),Deug Woo Lee(이득우) 한국기계가공학회 2009 한국기계가공학회 춘추계학술대회 논문집 Vol.2009 No.6월
This paper demonstrates mechanical nanomachining of single crystal silicon using an atomic force microscope with a polycrystalline diamond (PCD) tip cantilever. To enable nanomachining of silicon, a nanomachining cantilever with a pyramidal PCD tip was developed using mems-based photolithography and hot-filament chemical vapor deposition (HF-CVD). Mechanical nanomachining experiments on silicon using the cantilever are demonstrated under various machining parameters. Our results showed that either protruding or depressed patterns could be generated on the scratched surface by controlling normal load, scan pitch, and etching condition. The unique mask effect of brittle material after mechanical scratching under PCD tool can be controlled by the conventional mechanical machining conditions such as chip formation, plastic flow, and material removal.
Surface Topography on Silicon by AFM-based Nanomachining using PCD Tip
Jeong Woo Park(박정우),Deug Woo Lee(이득우) 한국기계가공학회 2009 한국기계가공학회 춘추계학술대회 논문집 Vol.2009 No.6
This paper demonstrates mechanical nanomachining of single crystal silicon using an atomic force microscope with a polycrystalline diamond (PCD) tip cantilever. To enable nanomachining of silicon, a nanomachining cantilever with a pyramidal PCD tip was developed using mems-based photolithography and hot-filament chemical vapor deposition (HF-CVD). Mechanical nanomachining experiments on silicon using the cantilever are demonstrated under various machining parameters. Our results showed that either protruding or depressed patterns could be generated on the scratched surface by controlling normal load, scan pitch, and etching condition. The unique mask effect of brittle material after mechanical scratching under PCD tool can be controlled by the conventional mechanical machining conditions such as chip formation, plastic flow, and material removal.
AFM 기반 액중 Tribo nanolithography 에서의 마스크 층 내식각성에 관한 연구
박정우(Jeong Woo Park),이득우(Deug Woo Lee) 한국정밀공학회 2005 한국정밀공학회 학술발표대회 논문집 Vol.2005 No.10월
Etch resistance of mask layer on silicon substrate modified by AFM-based Tribo-Nanolithography (TNL) in Aqueous Solution in an aqueous solution was demonstrated. TNL consists of sequential processes, nano-scratching and wet chemical etching. The simple scratching can form a mask layer on the silicon substrate, which acting as an etching mask. For TNL, a specially designed cantilever with diamond tip, allowing the formation of mask layer on silicon substrate easily by a simple scratching process, has been applied instead of conventional silicon cantilever for scanning. This study demonstrates how the TNL parameters can affect the etch resistance of mask layer, hence introducing a new process of AFM-based maskless nanolithography in aqueous solution.