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동적 패턴 생성기를 이용한 3차원 미세 구조물의 경화특성
하영명(Y. M. Ha),최재원(J. W. Choi),안대건(D. K. Ahn),이석희(S. H. Lee),하창식(C. S. Ha) 한국정밀공학회 2005 한국정밀공학회 학술발표대회 논문집 Vol.2005 No.10월
Microstereolithography(MSL) has evolved from the stereolithography technique, and is also based on a light-induced layer-stacking fabrication. Although integral MSL allows the manufacture of a complete layer by one irradiation only, there is a problem related with shape precision due to the light-intensity distribution of focused image. In this study, we developed the integral MSL apparatus using Digital Micromirror Device (DMDTM, Texas Instruments) as dynamic pattern generator. It is composed of Xenon-Mecury lamp, optical devices, pattern generator, precision stage, controllers and the control program. Also, we have studied curing depth and width of photocurable resin according to the change of exposure energy.
동적 패턴 생성기를 이용한 마이크로 광 조형 시스템에서 수지 유동 해석 및 자유표면 형성에 관한 연구
원명호(M. H. Won),최재원(J. W. Choi),하영명(Y. M. Ha),이석희(S. H. Lee),김호찬(H. C. Kim) 한국정밀공학회 2005 한국정밀공학회 학술발표대회 논문집 Vol.2005 No.10월
A Stereolithography technology is based on stacking of sliced layer from STL file that is converted from 3-dimensional CAD data. A microstereolithography technology is evolved from conventional stereolithography to fabricate microstructures. In this technology, we have to consider influence of resin flow to make refresh surface. To generate new resin surface, stage has to be moved downward deeply and upward to desired position. At this time, resin flow affects to refresh surface of resin. And resin viscosity is the key factor in simulation of resin flow. By setting optimal refresh time for resin surface, total fabrication time is reduced and there is no damage to fabricated layers. In this research, we simulate resin flow using CFD software and derive optimal stage moving time and dwelling time.
돌출 형상을 가진 마이크로 구조물 가공을 위한 광경화성 수지의 경화 특성
정명관(M. G. Jeoung),최재원(J. W. Choi),하영명(Y. M. Ha),이석희(S. H. Lee),김호찬(H. C. Kim) 한국정밀공학회 2006 한국정밀공학회 학술발표대회 논문집 Vol.2006 No.5월
In the microstereolithography which can make 3-D microstructures, curing depth is different according to exposure energy. Curing depth has to be controlled to fabricate complex 3-D microstructures with overhang shape. It becomes i ncreases when the exposure energy increases. And photocurable resin is cured when the exposure energy is bigger than critical energy. So optimal exposure energy has to be found to fabricate overhang structures without being gel. To make thinner layer, UV absorber is used and exposure pattern is changed. In this paper, we find curing characteristics according to exposure energy, and fabricate microstructures with overhang shape.