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Fe-Hf-N 박막의 미세조직과 자기적 특성에 관한 연구
맹기호,강계명 서울産業大學校 2005 논문집 Vol.54 No.1
The electronic components with high functionality and high integration have been successfully developed by virtue of thin film and grain refinement techniques, allowing industrial devices to be high-functionalized and miniaturized. Considering a strong demand for high-speed transmission and high-density storage of data by further miniaturization and high frequency operation, the control of the soft magnetic properties in the components is strongly required. It has been reported that thin film technique in the fabrication processing of the soft magnetic materials makes the miniaturization of the components possible, because thin film device shows an excellent magnetic properties. In this research, to suggest an optimal condition for fabrication of the magnetic thin film with excellent magnetic properties, microstructural characteristics and properties of the Fe-Hf-N thin film are analyzed. The amorphous thin films of Fe-Hf with different composition of Hf are prepared by a RF magnetron sputtering method. To synthesize crystalline thin films of Fe-Hf-N, as-deposited Fe-Hf films are heat-treated at 550°C under a nitrogen atmosphere. The microstructure of thin films is observed by the transmission electron microscopy, and the relationship between microstructure and magnetic properties is analyzed.
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