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RF-마크네트론 스퍼터링으로 증착된 산화주석 전자수송층의 광학적 및 전기적 특성에 대한 증착 전력의 영향
황지성(Ji Seong Hwang),이원규(Wonkyu Lee),황재근(Jae Keun Hwang),이상원(Sang-Won Lee),현지연(Ji Yeon Hyun),이솔희(Solhee Lee),정석현(Seok Hyun Jeong),강윤묵(Yoonmook Kang),김동환(Donghwan Kim),이해석(Hae-Seok Lee) 한국태양광발전학회 2021 Current Photovoltaic Research Vol.9 No.1
The properties of the electron transport layer (ETL) have a great effect on perovskite solar cell performance. Depositing conformal SnO₂ ETL on bottom textured silicon cells is essential to increase current density in terms of the silicon-perovskite tandem solar cells. In the recent study, the SnO₂ electron transport layer deposited by the sputtering method showed an efficiency of 19.8%. Also, an electron transport layer with a sputtered TiO₂ electron transport layer in a 4-terminal tandem solar cell has been reported. In this study, we synthesized SnOx ETL with a various sputtering power range of 30-60W by Radio-frequency (RF)-magnetron sputtering. The properties of SnOx thin film were characterized using ellipsometer, UV-vis spectrometer, and IV measurement. With a sputtering power of 50W, the solar cell showed the highest efficiency of 13.3%, because of the highest fill factor by the conductivity of SnOx film.