태양전지용 MgF₂ 반사방지막 특성연구

다국어 초록 (Multilingual Abstract)

MgF₂ is a current material for the optical applications in the UV and deep UV range. Process variables for manufacturing the MgF₂ thin film were established in order to clarify optimum conditions for growth of the thin film depending upon process conditions, and then by changing a number of vapor deposition conditions and substrate temperature, Annealing conditions variously, structural and Optical characteristics were measured. Thereby, optimum process variables were derived. Nevertheless, modern applications still require improvement of the optical and structural quality of the deposited layers. In the present work, the composition and microstructure of MgF₂ single layers grown on slide glass substrate by Electro beam Evaporator(KV-660) processes, were analyzed and compared. The surface Substrate temperature having an effect on the quality of the thin film was changed from 200[?C] to 350[?C] at intervals of 50[?C]. and annealing temperature an effect on the thin film was changed from 200[?C] to 400[?C] at intervals of 50[?C]. Physical properties of the thin film were investigated at various fabrication conditions substrate temperature, annealing and temperature, annealing time by XRD, FE-SEM.