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      KCI등재 SCOPUS SCIE

      Bubble formation in high-viscosity liquids in step-emulsification microdevices

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      https://www.riss.kr/link?id=A108471398

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      다국어 초록 (Multilingual Abstract)

      Bubble formation in high-viscosity liquids in step-emulsification microdevices is presented. Nitrogen isused as the dispersed phase. Glycerol aqueous solutions with concentration more than 60% (w/w) areused as the continuous phase to show the effect o...

      Bubble formation in high-viscosity liquids in step-emulsification microdevices is presented. Nitrogen isused as the dispersed phase. Glycerol aqueous solutions with concentration more than 60% (w/w) areused as the continuous phase to show the effect of high viscosity liquid. It was found that the transitionof flow patterns of gas–liquid two-phase flow can be divided into two categories: bubbly flow and parallelflow. Compared with the cases in low viscosity liquid, the wettability with wall was deteriorated andthe resistance in chamber were enhanced, greatly. All of these effects cause different performance ofinterface evolution during bubble formation and the volume and formation frequency after pinchingoff. Therefore, the relative magnitude of pressure variation between chamber and gas inlet was changedto affect the flow pattern and monodispersity when the operation conditions were changed.

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      참고문헌 (Reference) 논문관계도

      1 W. Drenckhan, 222 : 228-259, 2015

      2 C. N. Baroud, 10 : 2032-2045, 2010

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      4 S. Sugiura, 227 : 95-103, 2000

      5 T. Thorsen, 86 : 4163-4166, 2001

      6 S. Mi, 58 : 10092-10105, 2019

      7 T. Fu, 135 : 343-372, 2015

      8 F. Malloggi, 26 : 2369-2373, 2010

      9 Y. J. Zhao, 133 : 8790-8793, 2011

      10 N. Mittal, 26 : 082109-, 2014

      1 W. Drenckhan, 222 : 228-259, 2015

      2 C. N. Baroud, 10 : 2032-2045, 2010

      3 H. A. Stone, 645 : 1-, 2010

      4 S. Sugiura, 227 : 95-103, 2000

      5 T. Thorsen, 86 : 4163-4166, 2001

      6 S. Mi, 58 : 10092-10105, 2019

      7 T. Fu, 135 : 343-372, 2015

      8 F. Malloggi, 26 : 2369-2373, 2010

      9 Y. J. Zhao, 133 : 8790-8793, 2011

      10 N. Mittal, 26 : 082109-, 2014

      11 Z. Li, 15 : 1023-1031, 2015

      12 P. Zhu, 17 : 34-75, 2016

      13 S. Mi, 2019

      14 S. Mi, 2020

      15 M. Hashimoto, 6 : 1051-1059, 2010

      16 T. Fu, 65 : 3739-3748, 2010

      17 M. J. Jensen, 18 : 077103-, 2006

      18 M. Stoffel, 108 : 198302-, 2012

      19 E. Stolovicki, 18 : 132-138, 2017

      20 A. S. Opalski, 19 : 1183-1192, 2019

      21 M. De Menech, 595 : 2008

      22 N. Shao, 64 : 2749-2761, 2009

      23 A. P. Kotula, 8 : 10759-, 2012

      24 J. P. Raven, 97 : 154501-, 2006

      25 P. Garstecki, 97 : 024503-, 2006

      26 V. Miralles, 112 : 238302-, 2014

      27 M. J. Fuerstman, 7 : 1479-1489, 2007

      28 M.L. Eggersdorfer, 115 : 9479-9484, 2018

      29 T. Fu, 144 : 75-86, 2016

      30 P. Garstecki, 94 : 164501-, 2005

      31 Y. Li, 89 : 8273-8281, 2017

      32 Y. Liu, 132 : 606-617, 2019

      33 W. Postek, 17 : 1323-1331, 2017

      34 H. D. Xi, 17 : 751-771, 2017

      35 C. Zheng, 61 : 1663-1676, 2015

      36 M. Al-Rawashdeh, 207–208 : 645-655, 2012

      37 J. Rodríguez-Rodríguez, 47 : 405-429, 2015

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