<P>Highly ordered nanoporous anodic aluminum oxide (AAO) thin films were fabricated in oxalic acid under a constant voltage via a two-step anodization process. To investigate the high-aspect-ratio (7.5:1) filling process, both sputtering and ato...
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https://www.riss.kr/link?id=A107483624
2015
-
SCOPUS
학술저널
166
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
<P>Highly ordered nanoporous anodic aluminum oxide (AAO) thin films were fabricated in oxalic acid under a constant voltage via a two-step anodization process. To investigate the high-aspect-ratio (7.5:1) filling process, both sputtering and ato...
<P>Highly ordered nanoporous anodic aluminum oxide (AAO) thin films were fabricated in oxalic acid under a constant voltage via a two-step anodization process. To investigate the high-aspect-ratio (7.5:1) filling process, both sputtering and atomic layer deposition (ALD) were used to form TiO<SUB>2</SUB> nanowires. Field emission scanning electron microscopy and high-resolution transmission electron microscopy images indicated that mushroom-like TiO<SUB>2</SUB> structures were sputtered onto the AAO template surface, and the ALD-coated TiO<SUB>2</SUB> exhibited fine filling results and clear crystal grain boundaries. Large-scale and free-standing TiO<SUB>2</SUB> nanowire arrays were liberated by selectively removing the aluminum substrate and AAO template via a wet etching process with no collapsing or agglomeration after the drying process. ALD-deposited TiO<SUB>2</SUB> nanowire arrays that were 67 nm in diameter and 400 nm high were transferred from the AAO template. The ALD process enabled the rapid, simple synthesis of highly ordered TiO<SUB>2</SUB> nanowire arrays with desired parameters such as diameter, density, and thickness determined using diverse AAO templates.</P>
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