ECWR plasma로 제작한 ta-C:H 박막의 광학적 특성 분석 = A Optical property Analysis of ta-C:H Films Prepared by ECWR Plasma

다국어 초록 (Multilingual Abstract)

In this study, tetrahedral amorphous carbon films(ta-C:H) are prepared by using electron cyclotron wave resonance(ECWR) acetylene plasma with varying bias voltage. To investigate variations in the optical properties of ta-C:H films due to various bias voltages, we use spectroscopic ellipsometry(SE), and then calculate optical constants of them Furthermore, Raman spectroscopy is used to look into relations between optical and microstructural properties of them. As a result, refractive indices of ta-C:H are larger than 2, but band gaps are about 1.45 eV which are not suitable for optical applications. We found that optical constants are dependent on plasma conditions, and moreover, refractive index is increased as an ion energy is increased in ECWR plasma, while a band gap is decreased. Therefore, ta-C:H films, which has a better optical property than them, can be fabricated to control plasma conditions. And, they can be applied to optical and protective coatings when multilayer is built of ta-C:H layer with a high refractive index and oxide layer with a low index.

목차 (Table of Contents)

• Abstract
• Ⅰ. 서론
• Ⅱ. 실험방법
• Ⅲ. 결과 및 고찰
• Ⅳ. 결론
• 참고문헌