Low energy electrons and surface chemistry

목차 (Table of Contents)

• CONTENTS
• 1 Basic Concepts = 1
• 1.1 Introduction = 1
• 1.2 Principles of ultrahigh vacuum techniques = 2
• 1.2.1 Why is UHV necessary? = 2
• 1.2.2 Production of ultrahigh vacuum = 3
• 1.2.3 Pressure measurement = 4
• 1.2.4 -Gas handling = 4
• 1.3 Preparation of clean surfaces = 5
• 1.4 Interaction of low energy electrons with matter = 6
• 1.5 Electron energy analyzers = 9
• 1.5.1 Retarding field grid analyzer (RFA) = 9
• 1.5.2 Cylindrical mirror analyzer (CMA) = 11
• 1.5.3 127°-analyzer = 13
• 1.5.4 Concentric hemisphere analyzer (CHA) = 14
• 1.6 Refences = 15
• 2 Auger electron spectroscopy = 17
• 2.1 Historical development = 17
• 2.2 Instrumentation = 18
• 2.2.1 Source of excitation = 18
• 2.2.2 Sample = 20
• 2.2.3 Analyzer and detector system = 20
• 2.2.4 Further refinements = 23
• 2.3 Mechanism of the Auger process = 28
• 2.4 Energies and shapes of the Auger peaks = 33
• 2.4.1 free atoms = 33
• 2.4.2 Condensed matter = 34
• 2.4.3 Chemical effects = 37
• 2.5 Intensity of the Auger electron emission = 40
• 2.5.1 Auger yield = 40
• 2.5.2 Ionization cross section = 42
• 2.5.3 Auger electron emission from condensed matter = 43
• 2.6 Detected volume = 45
• 2.7 Qualitative analysis = 47
• 2.8 Quantitative analysis = 47
• 2.8.1 Determination of relative surface quantities = 48
• 2.8.2 Absolute surface quantities = 48
• 2.8.3 Alloys = 49
• 2.8.4 Depth profiling = 55
• 2.8.5 Kinetic studies = 56
• 2.9 Deconvolution technique and band strucure = 57
• 2.10 References = 61
• 3 X-ray photoelectron spectroscopy (XPS) = 65
• 3.1 Introduction = 65
• 3.2 Instrumentation = 65
• 3.2.1 Light sources = 65
• 3.2.2 Analyzer and detector = 66
• 3.2.3 Data analysis = 67
• 3.3 Physical Principles = 69
• 3.4 Qualitative surface analysis = 70
• 3.4.1 Identification of elements = 70
• 3.4.2 Core-level chemical shifts = 71
• 3.5 Quantitative analysis = 74
• 3.6 Final state effects = 79
• 3.6.1 Relaxation effects = 79
• 3.6.2 Multiplet splitting = 79
• 3.6.3 Multi-electron excitations = 80
• 3.6.4 Core-level satellites = 81
• 3.7 Angular effects = 82
• 3.8 References = 83
• 4 Ultraviolet photoelectron spectroscopy (UPS) = 87
• 4.1 Introduction = 87
• 4.2 Instrumentation = 89
• 4.2.1 Light sources = 89
• 4.2.1.1 Lightsources = 89
• 4.2.1.2 Continuous sources = 90
• 4.2.2 Sample = 93
• 4.2.3 Analyzer and detector = 93
• 4.3 Photoionization process = 94
• 4.3.1 Photoionization of atoms = 95
• 4.3.2 Photoionization of molecules = 97
• 4.3.3 Photoemission from solids = 101
• 4.4 UPS from clean surfaces = 108
• 4.4.1 Angle integrated photoemmission = 109
• 4.4.2 Angle resolved Photoemission = 110
• 4.5 UPS from adsorbate covered surfaces = 114
• 4.5.1 Adsorbed atoms = 117
• 4.5.2 Adsorbed noble gases = 122
• 4.5.3 Adsorbed molecules = 128
• 4.5.3.1 Adsorbed CO = 129
• 4.5.3.2 Adsorbed polyatomics = 138
• 4.6 References = 143
• 5 Electron spectroscopy with noble gas ions and metastable atoms = 147
• 5.1 Introduction = 147
• 5.2 Instrumentation = 147
• 5.3 Deexcitation mechanisms = 148
• 5.4 Auger neutralization = 150
• 5.5 Auger deexcitation (Penning ionization) = 153
• 5.6 References = 156
• 6 Appearance potential spectroscopy = 157
• 6.1 Introduction = 157
• 6.2 Instrumentation = 158
• 6.3 Mechanism = 160
• 6.4 Core-level binding energies = 163
• 6.5 Surface analysis = 165
• 6.6 Band structure and deconvolution = 165
• 6.7 Adsorbate studies／Chemical effects = 170
• 6.8 Extended fine structure = 171
• 6.9 References = 173
• 7 Inverse photoemission (IPE, HIS) = 175
• 7.1 Introduction = 175
• 7.2 Instrumentation = 175
• 7.3 Mechanism of IPE = 176
• 7.4 Clean surfaces = 178
• 7.5 Adsorbate studies = 181
• 7.6 References = 183
• 8. Electron energy loss spectroscopy (ELS, EELS) = 185
• 8.1 Introduction = 185
• 8.2 Instrumentation = 186
• 8.3 Ionization losses = 187
• 8.4 Plasmon losses and intraband transitions = 190
• 8.5 Extended loss fine structure = 195
• 8.6 Adsorbate induced losses = 197
• 8.7 References = 199
• 9 Low energy electron diffraction (LEED) = 201
• 9.1 Introduction and historical development = 201
• 9.2 Classification of periodic surface structures = 203
• 9.2.1 Substrate and surface structures = 203
• 9.2.2 Surfaces with periodic steps and kinks = 206
• 9.3 Formation of tbe diffraction pattern = 207
• 9.4 Instrumentation = 209
• 9.4.1 Introduction = 209
• 9.4.2 Electron gun = 209
• 9.4.3 Detectorsystem = 210
• 9.5 Geometrical theory of diffraction = 214
• 9.5.1 Introduction = 214
• 9.5.2 The reciprocal lattice = 215
• 9.5.3 Interference conditions and the Ewald construction = 217
• 9.5.4 Analysis of a simple diffraction patten = 219
• 9.5.6 Domain structures = 220
• 9.5.6 LEED patterns of incommensurate structures = 224
• 9.6 Kinematic theory = 226
• 9.6.1 Introduction = 226
• 9.6.2 Scatteriing at two-dimentional lattices = 226
• 9.6.3 Kinematical structure factor = 227
• 9.6.4 Intensity-voltage(I/V)curves = 230
• 9.7 Disordered structures = 232
• 9.7.1 Introduction = 232
• 9.7.2 he transfer width = 233
• 9.7.3 Size effects and one-dimensional disorder = 234
• 9.7.4 Lattice gas systems = 238
• 9.7.5 Antiphase domains = 242
• 9.7.6 Facets = 244
• 9.7.7 Stepped surfaces = 246
• 9.8 Simulation of diffraction patterns = 248
• 9.9 Dynamical theories = 250
• 9.9.1 Introduction = 250
• 9.9.2 Physical parameters entering a dynamical theory = 251
• 9.9.3 Multiple scattering = 253
• 9.9.4 Data evaluation = 255
• 9.10 Temperature effects = 257
• 9.11 Spin-polarized LEED = 261
• 9.12 References = 262
• 10 X-ray absorption fine structure (EXAFS) = 267
• 10.1 Introduction = 267
• 10.2 Instrumentation = 268
• 10.3 Theory of EXAFS = 270
• 10.4 EXAFS data alnalysis = 272
• 10.5 Applications of EXAFS to surface problems = 277
• 10.5.1 Supported catalysts = 277
• 10.5.2 Adsorbed layers = 277
• 10.6 Near-edge structure (XANES) = 280
• 10.7 References = 282
• 11 Vibrational spectroscopy (HREELS, EELS) = 285
• 11.1 Introduction = 285
• 11.2 Instrumentation = 286
• 11.3 Symmentry aspects of vibrating adsorbed molecules = 288
• 11.3.1 General remarks = 288
• 11.3.2 Symmetry elements = 289
• 11.3.3 Point groups and representations = 291
• 11.3.4 Irreducible representations = 293
• 11.3.5 Symmetry properties of displacements = 294
• 11.3.6 Application to degenerate point groups = 299
• 11.3.7 Symmetry of adsorbed atoms = 302
• 11.3.8 Symmetry of adsorbed molecules = 303
• 11.4 Normal vibrations = 305
• 11.5 Group frequencies = 308
• 11.6 Theory of the electron scattering mechanism = 308
• 11.6.1 Surface dipole scattering = 308
• 11.6.2 Electron impact mechanism = 311
• 11.6.3 Negative ion resonances = 313
• 11.7 Experimental results = 313
• 11.7.1 Clean surfaces = 313
• 11.7.2 Adsorbed atoms = 323
• 11.7.3 Adsorbed diatomics = 323
• 11.7.4 Adsorbed polyatomics = 326
• 11.7.5 Reaction intermediates = 329
• 11.8 References = 332
• 12 Electron and photon stimulated desorption = 335
• 12.1 Introduction = 335
• 12.2 Experimental = 335
• 12.2.1 Changes of surface properties = 336
• 12.2.2 Detection of desorbing species = 336
• 12.3 Cross sections for desorption = 339
• 12.4 Mechanisms for desorption = 341
• 12.5 Angular distribution of desorbing ions (ESDIAD) = 343
• 12.6 References = 345
• 13 Appendix = 347
• 13.1 Fundamental constants = 347
• 13.2 Properties of selected elements = 347
• 13.3 Line positiol in XPS using Al-$$K_d$$ radiation = 347
• 13.4 XPS atomic sensitivity factors = 350
• 13.5 Kinetic energies of Auger electrons = 354
• 13.6 Relative Auger sensitivity factors = 357
• 13.7 Character tables = 365
• 13.8 Characteristic group frequencies = 367
• 13.9 Abbreviations and acronyms = 369
• Index = 371