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FR-17 A Personal Historical Perspective of Ion Implantation Equipment for Semiconductor Applications
McKenna, C. M. IEEE 2000 p.1-19
PL-2 Trend of the CMOS Process Technology for System on a Chip
Nishimura, T. IEEE 2000 p.20-24
Bourdelle, K. K.;Gossmann, H.-J.;Chaudhry, S.;Agarwal, A. IEEE 2000 p.25-27
Chou, J. W.;Hong, G.;Lin, K. C.;Cheng, Y.-C.;Chen, C.;Chang, C. Y. IEEE 2000 p.28-31
Stegemann, K.-H.;Thees, H.-J.;Wittmaack, M.;Borany, J. v.;Heinig, K. H.;Gebel, T. IEEE 2000 p.32-37
Graoui, H.;Nejim, A.;Hemment, P.;Riley, L.;Hall, S.;Mitchell, M.;Ashburn, P. IEEE 2000 p.38-41
Variam, N.;Mehta, S.;Feudel, T.;Horstmann, M.;Krueger, C.;Ng, C.;Posselt, M. IEEE 2000 p.42-45
MO-10 Junction Capacitance Reduction by S/D Junction Compensation Implant
Curello, G.;Rengarajan, R.;Faul, J.;Kieslich, A.;Glawischnig, H. IEEE 2000 p.46-49
Kim, N.-S.;Kim, I.-G.;Ok, S.-H.;Kim, D.-C.;Choi, S.-J.;Choi, J.-H.;Kwon, H.-Y.;Park, D.-Y.;Kim, J.-B. IEEE 2000 p.50-53
Al-Bayati, A.;Tandon, S.;Mayur, A.;Foad, M.;Wagner, D.;Murto, R.;Sing, D.;Ferguson, C.;Larson, L. IEEE 2000 p.54-57