http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
이 학술지의 논문 검색
Implementation of Atomic Layer Deposition in Advanced Semiconductor Processes
Schaekers, M.; Van Ammel, A.; Travaly, Y.; Delabie, A.; Hoyas, A. M.; Zhao, C. Pennington, N.J.:; Electrochemical Society, 2005 p.3-14
Kirsch, P.; Quevedo-Lopez, M.; Krishnan, S.; Song, S.; Choi, R.; Majhi, P.; Senzaki, Y.; Bersuker, G.; Lee, B. Pennington, N.J.:; Electrochemical Society, 2005 p.15-28
ALD: Emerging Materials, Processes, and Nanoscale Technology Applications
Eisenbraun, E.; Carpenter, M.; Siddique, R.; Naczas, S.; Zeng, W.; Luo, F.; Kaloyeros, A. Pennington, N.J.:; Electrochemical Society, 2005 p.29-36
ALD for Data Storage Applications
Mao, M.; Bubber, R.; Schneider, T. Pennington, N.J.:; Electrochemical Society, 2005 p.37-50
Metal-Organic Atomic Layer Deposition of Metals for Applications in Interconnect Technology
van der Straten, O.; Rossnagel, S.; Doyle, J.; Rodbell, K. Pennington, N.J.:; Electrochemical Society, 2005 p.51-56
Iridium Barriers for Direct Copper Electrodeposition in Damascene Processing
Josell, D.; Bonevich, J.; Moffat, T.; Aaltonen, T.; Ritala, M.; Leskela, M. Pennington, N.J.:; Electrochemical Society, 2005 p.57-62
Platinum Liner Deposited by Atomic Layer Deposition for Cu Interconnect Application
Zhu, Y.; Dunn, K.; Kaloyeros, A. Pennington, N.J.:; Electrochemical Society, 2005 p.63-70
LEIS Study of ALD WN~xC~y Growth on Dielectric Layers
Stokhof, M.; Sprey, H.; Li, W.; Haukka, S.; de, M. R.; Brongersma, H. Pennington, N.J.:; Electrochemical Society, 2005 p.71-78
Low-k SiBN (Silicon Boron Nitride) Film Synthesized by a Plasma-Assisted Atomic Layer Deposition
Yang, S.; Kim, J.; Noh, J.; Kim, H.; Lee, S.; Ahn, J.; Hwang, K.; Shin, Y.; Chung, U.; Moon, J. Pennington, N.J.:; Electrochemical Society, 2005 p.79-94
ALD Precursor Development: Challenges, Opportunities and Managing Uncertainty
Hoover, C. A. Pennington, N.J.:; Electrochemical Society, 2005 p.95-102