MOCVD법에 의해 제조된 Fe₂O₃-TiO₂계 산화물 박막의 내식특성에 관한 연구 = A Study on the Corrosion Resistance Properties of Fe₂O₃-Tio₂Oxide Thin Films Prepared by MOCVD

다국어 초록 (Multilingual Abstract)

Fe₂O₃-TiO₂artificial passive films were formed at the temperatures of 200-350℃ by low pressure MOCVD technique. The relationship between the formation temperature and corrosion resistance of the Fe₂O₃-TiO₂films was examined in acid solutions. Fe₂O₃-TiO₂films deposited above 300℃ were crystalline and the films deposited below 250℃ were amorphous. The dissolution rate of the Fe₂O₃-TiO₂films deposited at 200 and 250℃ decreased with increasing the formation temperature in 5 M HCl, but the films deposited at 300 and 350℃ hardly dissolved in the solution. The films deposited at 200 and 350℃ easily dissolved at cathodic potentials in 1 M H₂SO₄and HCl owing to te selective reduction of iron oxide components in the films. But, the selective reduction in the films deposited at 300 and 350℃ was suppressed. The Fe₂O₃-TiO₂films deposited above 300℃ have higher corrosion resistance than that of the films deposited below 250℃, because the former have high crystallinity and cotain high chemical resistant oxides.