접합유리와 반응된 Fe - Hf - N 박막의 연자기 특성

다국어 초록 (Multilingual Abstract)

The purpose of this study is to investigate the effect of chemical reaction with a bonding glass on physical and magnetic properties of Fe-Hf-N/SiO₂ and Fe-Hf-N/Cr/SiO₂ thin films. When the Fe-Hf-N/SiO₂ films were reacted with the bonding glass, the soft magnetic properties of them were extremely degraded. At 600℃, the saturation magnetization of the reacted film decreased to 1 kG, and its coercivity increased to 27 Oe, and its effective permeability decreased to 70. It was found that the degradation of soft magnetic properties of the Fe-Hf-N/SiO₂ films reacted with the bonding glass were attributed to the oxidation of the Fe-Hf-N layers to HfO₂ and Fe₃O₄. The soft magnetic properties of the Fe-Hf-N/Cr/SiO₂ films reacted with the bonding glass were degraded less than those of Fe-Hf-N/SiO₂ films. At 600℃, the saturation magnetization of the reacted film decreased to 13.5 kG, and its coercivity increased to 4 Oe, and its effective permeability decreased to 700. It was found that the Cr layer suppressed the oxidation of the Fe-Hf-N layers during the chemical reaction between the Fe-Hf-N layer and bonding glass.