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    KCI등재 SCIE SCOPUS

    Extension of DRAM Retention Time at 77 Kelvin by Replacing Weak Rows with Large GIDL Current

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    https://www.riss.kr/link?id=A108168304

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    다국어 초록 (Multilingual Abstract) kakao i 다국어 번역

    At 77 Kelvin, it was found that the weak cells with large gate-induced drain leakage current are quite localized in six weak rows out of the entire 524,288 rows of a 8 Gb DRAM chip. By replacing the six weak rows, the DRAM retention time was increased from 8 to 4096 seconds at 77 Kelvin.
    Because this retention time is over 64,000 times longer than the JEDEC retention-time specification of 0.064 seconds, the DRAM refresh power can be reduced to a negligible level at the data center. To achieve this, the DRAM controller was modified to find weak rows by using three different data patterns at power-on reset and a reserved row of DRAM is used when access to a weak row address occurs during the normal operation.
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    At 77 Kelvin, it was found that the weak cells with large gate-induced drain leakage current are quite localized in six weak rows out of the entire 524,288 rows of a 8 Gb DRAM chip. By replacing the six weak rows, the DRAM retention time was increased...

    At 77 Kelvin, it was found that the weak cells with large gate-induced drain leakage current are quite localized in six weak rows out of the entire 524,288 rows of a 8 Gb DRAM chip. By replacing the six weak rows, the DRAM retention time was increased from 8 to 4096 seconds at 77 Kelvin.
    Because this retention time is over 64,000 times longer than the JEDEC retention-time specification of 0.064 seconds, the DRAM refresh power can be reduced to a negligible level at the data center. To achieve this, the DRAM controller was modified to find weak rows by using three different data patterns at power-on reset and a reserved row of DRAM is used when access to a weak row address occurs during the normal operation.

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    참고문헌 (Reference)

    1 K. T. Malladi, "Towards energy-proportional datacenter memory with mobile DRAM" 37-48, 2012

    2 K. Rais, "Temperature dependence of gate induced drain leakage current in silicon CMOS devices" 30 (30): 32-34, 1994

    3 K. Lim, "System-level implications of disaggregated memory" 1-12, 2012

    4 J. Liu, "RAIDR:Retention-aware intelligent DRAM refresh" 1-12, 2012

    5 T. Hamamoto, "On the retention time distribution of dynamic random access memory (DRAM)" 45 (45): 1300-1309, 1998

    6 A. Alnuaimi, "Electric-field and temperature dependence of the activation energy associated with gate induced drain leakage" 113 (113): 2013

    7 F. Wang, "DRAM Retention at Cryogenic Temperatures" 1-4, 2018

    1 K. T. Malladi, "Towards energy-proportional datacenter memory with mobile DRAM" 37-48, 2012

    2 K. Rais, "Temperature dependence of gate induced drain leakage current in silicon CMOS devices" 30 (30): 32-34, 1994

    3 K. Lim, "System-level implications of disaggregated memory" 1-12, 2012

    4 J. Liu, "RAIDR:Retention-aware intelligent DRAM refresh" 1-12, 2012

    5 T. Hamamoto, "On the retention time distribution of dynamic random access memory (DRAM)" 45 (45): 1300-1309, 1998

    6 A. Alnuaimi, "Electric-field and temperature dependence of the activation energy associated with gate induced drain leakage" 113 (113): 2013

    7 F. Wang, "DRAM Retention at Cryogenic Temperatures" 1-4, 2018

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    학술지 이력

    학술지 이력
    연월일 이력구분 이력상세 등재구분
    2023 평가 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
    2020-01-01 등재 등재학술지 유지 (해외등재 학술지 평가) KCI등재
    2014-01-21 학회명변경 영문명 : The Institute Of Electronics Engineers Of Korea -> The Institute of Electronics and Information Engineers KCI등재
    2010-11-25 학술지명변경 한글명 : JOURNAL OF SEMICONDUTOR TECHNOLOGY AND SCIENCE -> JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE KCI등재
    2010-01-01 등재 등재학술지 선정 (등재후보2차) KCI등재
    2009-01-01 등재 등재후보 1차 PASS (등재후보1차) KCI등재후보
    2007-01-01 등재 등재후보학술지 선정 (신규평가) KCI등재후보
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    학술지 인용정보

    학술지 인용정보
    기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
    2016 0.42 0.13 0.35
    KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
    0.3 0.29 0.308 0.03
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