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      KCI등재 SCIE SCOPUS

      Practical Silicon-backside-protection Method for Abnormally Detection

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      https://www.riss.kr/link?id=A106480745

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      다국어 초록 (Multilingual Abstract)

      Nowadays, security ICs such as cryptographic modules, TPMs (Trust Platform Modules), connected car ICs, and smart card protection methods have been enhanced due to the introduction of a variety of new attack methods. Additionally, their protection mechanisms are continuously being developed and evaluated. For these reasons, attacking or hacking security chips is now more difficult than it ever has been. Nevertheless, IC failure analysis tools are being greatly improved, with many developers using them. Additionally, in using these tools, many cases involve analyzing the integrated circuit. By exploiting this analysis, attackers can perform invasive attacks [1] or hack the IC from the backside more easily than ever before. However, due to the structure of an IC, making a circuit on the back side of the silicon is more difficult than doing so on the front side. In order to resolve this issue, this paper proposes a practical silicon-backside-protection method that can protect the IC from backside attacks while minimizing its size and increasing its coverage. The proposed method uses capacitance located between the metal-layer which is unused for routing, and uses it for a passive shield (dummy shield) area.
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      Nowadays, security ICs such as cryptographic modules, TPMs (Trust Platform Modules), connected car ICs, and smart card protection methods have been enhanced due to the introduction of a variety of new attack methods. Additionally, their protection mec...

      Nowadays, security ICs such as cryptographic modules, TPMs (Trust Platform Modules), connected car ICs, and smart card protection methods have been enhanced due to the introduction of a variety of new attack methods. Additionally, their protection mechanisms are continuously being developed and evaluated. For these reasons, attacking or hacking security chips is now more difficult than it ever has been. Nevertheless, IC failure analysis tools are being greatly improved, with many developers using them. Additionally, in using these tools, many cases involve analyzing the integrated circuit. By exploiting this analysis, attackers can perform invasive attacks [1] or hack the IC from the backside more easily than ever before. However, due to the structure of an IC, making a circuit on the back side of the silicon is more difficult than doing so on the front side. In order to resolve this issue, this paper proposes a practical silicon-backside-protection method that can protect the IC from backside attacks while minimizing its size and increasing its coverage. The proposed method uses capacitance located between the metal-layer which is unused for routing, and uses it for a passive shield (dummy shield) area.

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      참고문헌 (Reference)

      1 "http://samsungsemiconstory.com/817?category=537531"

      2 Robertus A. M., "US20100283456 Magnetic detection of back-side layer Victor Zieren"

      3 John Walker, "US patent - US 7,966,666 Chip attack protection"

      4 Sheshadri, Vijay Benakanakere, "UPSET TRENDS IN FLIP-FLOP DESIGNS AT DEEP" Vanderbilt University 2010

      5 Torrance, Randy, "The state-ofthe-art in IC reverse engineering" Springer 2009

      6 Wolfgang Rankl, "SmartCard Handbook"

      7 Mayes, Keith E., "Smart cards, tokens, security and applications. Vol. 2. No. 3" Springer 2008

      8 Ishai, Y., "Private circuits II: Keeping secrets in tamperable circuits" Springer 308-327, 2006

      9 Kyungsuk Yi, "Practical Silicon-Surface-Protection Method using Metal Layer" 대한전자공학회 16 (16): 470-480, 2016

      10 Knechtel, Johann, "Large-scale 3D chips:Challenges and solutions for design automation, testing, and trustworthy integration" 10 : 45-62, 2017

      1 "http://samsungsemiconstory.com/817?category=537531"

      2 Robertus A. M., "US20100283456 Magnetic detection of back-side layer Victor Zieren"

      3 John Walker, "US patent - US 7,966,666 Chip attack protection"

      4 Sheshadri, Vijay Benakanakere, "UPSET TRENDS IN FLIP-FLOP DESIGNS AT DEEP" Vanderbilt University 2010

      5 Torrance, Randy, "The state-ofthe-art in IC reverse engineering" Springer 2009

      6 Wolfgang Rankl, "SmartCard Handbook"

      7 Mayes, Keith E., "Smart cards, tokens, security and applications. Vol. 2. No. 3" Springer 2008

      8 Ishai, Y., "Private circuits II: Keeping secrets in tamperable circuits" Springer 308-327, 2006

      9 Kyungsuk Yi, "Practical Silicon-Surface-Protection Method using Metal Layer" 대한전자공학회 16 (16): 470-480, 2016

      10 Knechtel, Johann, "Large-scale 3D chips:Challenges and solutions for design automation, testing, and trustworthy integration" 10 : 45-62, 2017

      11 Xu, Song, "IC security evaluation against fault injection attack based on FPGA emulation" 2016

      12 Baker, R. Jacob, "CMOS: circuit design, layout, and simulation" Wiley-IEEE press 2019

      13 Helfmeier, C., "Breaking and entering through the silicon" ACM 733-744, 2013

      14 Manich, S., "Backside polishing detector: a new protection against backside attacks" 1-6, 2015

      15 Joint Interpretation Library, "Application of Attack Potential to Smartcards Similar Devices Version 3.0"

      16 Khurana, Neeraj, "Analysis of product hot electron problems by gated emission microscopy" 1986

      17 Bullag, Rex F., "Adaptive trimming test approach—The efficient way on trimming analog trimmed devices at wafer sort" IEEE 2014

      18 Bai, Peng, "A 65nm logic technology featuring 35nm gate lengths, enhanced channel strain, 8 Cu interconnect layers, low-k ILD and 0.57/spl mu/m/sup 2/SRAM cell" IEEE 2004

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2014-01-21 학회명변경 영문명 : The Institute Of Electronics Engineers Of Korea -> The Institute of Electronics and Information Engineers KCI등재
      2010-11-25 학술지명변경 한글명 : JOURNAL OF SEMICONDUTOR TECHNOLOGY AND SCIENCE -> JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE KCI등재
      2010-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2009-01-01 평가 등재후보 1차 PASS (등재후보1차) KCI등재후보
      2007-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.42 0.13 0.35
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.3 0.29 0.308 0.03
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