<P>We report edge-selective functionalization of graphite (EFG) for the production of large-area uniform graphene films by simply solution-casting EFG dispersions in dichloromethane on silicon oxide substrates, followed by annealing. The resulta...
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https://www.riss.kr/link?id=A107627890
2011
-
SCOPUS,SCIE
학술저널
4974-4980(7쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
<P>We report edge-selective functionalization of graphite (EFG) for the production of large-area uniform graphene films by simply solution-casting EFG dispersions in dichloromethane on silicon oxide substrates, followed by annealing. The resulta...
<P>We report edge-selective functionalization of graphite (EFG) for the production of large-area uniform graphene films by simply solution-casting EFG dispersions in dichloromethane on silicon oxide substrates, followed by annealing. The resultant graphene films show ambipolar transport properties with sheet resistances of 0.52–3.11 kΩ/sq at 63–90% optical transmittance. EFG allows solution processing methods for the scalable production of electrically conductive, optically transparent, and mechanically robust flexible graphene films for use in practice.</P><P><B>Graphic Abstract</B>
<IMG SRC='http://pubs.acs.org/appl/literatum/publisher/achs/journals/content/ancac3/2011/ancac3.2011.5.issue-6/nn201072m/production/images/medium/nn-2011-01072m_0003.gif'></P><P><A href='http://pubs.acs.org/doi/suppl/10.1021/nn201072m'>ACS Electronic Supporting Info</A></P><P><A href='http://pubs.acs.org/doi/suppl/10.1021/nn201072m'>ACS Electronic Supporting Info</A></P>
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