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      KCI등재 SCI SCIE SCOPUS

      Cost-effective, Large-area, Reusable Nanoimprint Molds for Polymer Nanostructures

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      https://www.riss.kr/link?id=A104324696

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      다국어 초록 (Multilingual Abstract)

      In this paper, we report the use of a heptadeca-fluoro-1,1,2,2 tetrahydrodecyl trichlorosilane (HDFS)-coated anodic aluminum oxide (AAO) template as a low-cost, large-area, reusable nanoimprint mold. Coating AAO with HDFS increases the water contact angle (CA) from 20˚ on a pristine AAO to 120˚ on an HDFS-coated AAO, thus lowering adhesion of the AAO mold. Nanostructured polydimethylsiloxane (PDMS) could then be easily obtained by using the direct imprinting method on HDFS-coated AAO without any external loads. After nanoimprinting with an HDFS-coated AAO mold, the CA of the mold rarely changes (120˚ to 115˚), thus demonstrating the possibility of a reusable AAO mold. The CA of PDMS increases up to ∼15˚ after nanoimprinting, and its transmittance decreases by 5 ∼ 30%, compared with that of a flat PDMS film, in the full visible range due to the scattering effect, which implies that the optical pathway of incident light could be extended in the nanostructured polymer. Therefore, our nanoimprinting method is expected to enable a variety of applications in next-generation soft optoelectronics.
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      In this paper, we report the use of a heptadeca-fluoro-1,1,2,2 tetrahydrodecyl trichlorosilane (HDFS)-coated anodic aluminum oxide (AAO) template as a low-cost, large-area, reusable nanoimprint mold. Coating AAO with HDFS increases the water contact a...

      In this paper, we report the use of a heptadeca-fluoro-1,1,2,2 tetrahydrodecyl trichlorosilane (HDFS)-coated anodic aluminum oxide (AAO) template as a low-cost, large-area, reusable nanoimprint mold. Coating AAO with HDFS increases the water contact angle (CA) from 20˚ on a pristine AAO to 120˚ on an HDFS-coated AAO, thus lowering adhesion of the AAO mold. Nanostructured polydimethylsiloxane (PDMS) could then be easily obtained by using the direct imprinting method on HDFS-coated AAO without any external loads. After nanoimprinting with an HDFS-coated AAO mold, the CA of the mold rarely changes (120˚ to 115˚), thus demonstrating the possibility of a reusable AAO mold. The CA of PDMS increases up to ∼15˚ after nanoimprinting, and its transmittance decreases by 5 ∼ 30%, compared with that of a flat PDMS film, in the full visible range due to the scattering effect, which implies that the optical pathway of incident light could be extended in the nanostructured polymer. Therefore, our nanoimprinting method is expected to enable a variety of applications in next-generation soft optoelectronics.

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      참고문헌 (Reference)

      1 S. Zankovych, 12 : 91-, 2001

      2 M-G. Kang, 22 : 4378-, 2010

      3 H. J. Lim, 12 : 5489-, 2012

      4 F. Hua, 4 : 2467-, 2004

      5 E. Bae, 37 : 1026-, 2000

      6 S-H. Park, 88 : 203105-, 2006

      7 A. Revzin, 17 : 5440-, 2001

      8 I. Maximov, 61 : 449-, 2002

      9 S. H. Ahn, 20 : 2044-, 2008

      10 W-H. Kim, 19 : 045302-, 2008

      1 S. Zankovych, 12 : 91-, 2001

      2 M-G. Kang, 22 : 4378-, 2010

      3 H. J. Lim, 12 : 5489-, 2012

      4 F. Hua, 4 : 2467-, 2004

      5 E. Bae, 37 : 1026-, 2000

      6 S-H. Park, 88 : 203105-, 2006

      7 A. Revzin, 17 : 5440-, 2001

      8 I. Maximov, 61 : 449-, 2002

      9 S. H. Ahn, 20 : 2044-, 2008

      10 W-H. Kim, 19 : 045302-, 2008

      11 Y. Lai, 34 : 44-, 2010

      12 H. J. Fan, 16 : 913-, 2005

      13 X. Chen, 15 : 1685-, 2004

      14 Y. X. Zhuang, 16 : 2259-, 2006

      15 M. J. Lee, 18 : 3115-, 2006

      16 L. Zaraska, 204 : 1729-, 2010

      17 K. Nielsch, 2 : 677-, 2002

      18 J-L. Wu, 5 : 959-, 2011

      19 Hwan Soo Jang, "Eliminating the undercut phenomenon in interference lithography for the fabrication of nano-imprint lithography stamp" 한국물리학회 10 (10): 1436-1441, 2010

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2011-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2009-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2007-01-01 평가 SCI 등재 (등재유지) KCI등재
      2005-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2002-07-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2000-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.47 0.15 0.31
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.26 0.2 0.26 0.03
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