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이 학술지의 논문 검색
Challenges and State of the Art in Simulation of Chemo-Mechanical Processes
Trickey, S. B.;Deymeier, P. Electrochemical Society 2001 p.3-17
SINGLE-WAFER SPIN CLEANING WITH REPETITIVE USE OF OZONIZED WATER AND DILUTED HF ("SCROD")
Osaka, T.;Okamoto, A.;Kuniyasu, H.;Hattori, T. Electrochemical Society 2001 p.3-14
EVALUATION OF NEW MEGASONIC SYSTEM FOR SINGLE WAFER CLEANING
Takeuchi, K.;Tomozawa, A.;Onishi, A.;Tanzawa, A.;Azuma, T.;Umemura, S.-I.;Wu, Y.;Bran, M.;Fraser, B. Electrochemical Society 2001 p.15-22
CMP Finite Element Contact Model: Wafer and Feature Scale
Kim, A.;Williams, M. K. R.;Tichy, J.;Cale, T. Electrochemical Society 2001 p.18-27
ADVANCED SINGLE CHEMISTRY ALKALINE CLEANING IN A SINGLE TANK TOOL
Onsia, B.;Schellkes, E.;Vos, R.;De Gendt, S.;Doll, O.;Fester, A.;Kolbesen, B.;Hoffman, M.;Hatcher, Z.;Wolke, K. Electrochemical Society 2001 p.23-30
Study on Nano-Scale Wear of Silicon Oxide in CMP Processes
Seta, S.;Nishioka, T.;Tateyama, Y.;Miyashita, N. Electrochemical Society 2001 p.28-33
NEW SHORT CYCLE WET CLEANING CONCEPT FOR 300 mm FABRICATION LINE
Verhaverbeke, S.;Truman, K. Electrochemical Society 2001 p.31-36
Multi-Scale Modeling of Flow and Mass-Transfer in Chemical Mechanical Polishing
Jiang, L.;Simka, H.;Shankar, S. Electrochemical Society 2001 p.34-44
IMPACT OF ORGANIC CONTAMINATION ON DEVICE PERFORMANCE
Riley, D.;Guan, J.;Gale, G.;Bersuker, G.;Bennett, J.;Lysaght, P.;Nguyen, B. Electrochemical Society 2001 p.39-46
Developing Engineered Particulate Systems for Oxide Chemical Mechanical Polishing
Basim, G. B.;Adler, J. J.;Mahajan, U.;Singh, R. K.;Moudgil, B. M. Electrochemical Society 2001 p.45-55