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이 학술지의 논문 검색
Ultra Low k Dielectric Materials and Technologies-Impact on Tool Development
Toma, D.;Kaushal, S.;Fatke, D. Electrochemical Society 2000 p.5-14
Study on Chemical-Mechanical Polishing of Low Dielectric Constant Polyimide Thin Films
Tai, Y. L.;Tsai, M. S.;Tung, I. C.;Dai, B. T.;Feng, M. S. Electrochemical Society 2000 p.15-23
Optimization of Teflon AF Film Characteristics Using Processing Parameters
Parihar, V.;Singh, R.;Thakur, R. P. S. Electrochemical Society 2000 p.24-31
Low Dielectric Polymer Etching with Downstream Microwave Plasma
Callahan, R.;Raupp, G.;Beaudoin, S. Electrochemical Society 2000 p.32-37
Nguyen, C. V.;Hawker, C. J.;Hedrick, J. L.;Jaffe, R. L.;Miller, R. D.;Remenar, J. F.;Rhee, H. W.;Toney, M. F.;Trollsas, M.;Volksen, W. Electrochemical Society 2000 p.38-45
Pingalay, D.;Perahia, D.;Timble, N.;Singh, R.;Poole, K. F. Electrochemical Society 2000 p.46-52
Theory for the Thickness Dependent Glass Transition Temperature of Amorphous Polymer Thin Films
Hsu, D. T.;Shi, F. G.;Zhao, B.;Brongo, M. Electrochemical Society 2000 p.53-61
Thickness Dependent Dielectric Properties of Low-K Materials: A Theoretical Model
Hsu, D. T.;Kim, H. K.;Shi, F. G.;Zhao, B.;Brongo, M. Electrochemical Society 2000 p.62-68
Thermal Stability of Electrodeposited Copper Interconnect with Low-K Films
Lee, S.;Lee, K.-W.;Yang, S.-H.;Kim, Y.-A.;Oh, K.;Park, J.-W. Electrochemical Society 2000 p.69-78
Singh, R. Electrochemical Society 2000 p.79-82