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The difference of plasma resistance between the CAS glass bulk and coating films were compared. Plasma resistance was confirmed by analyzing the etch rate and the microstructure of the surface when the CAS glass bulk and the glass coating film were et...
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RISS 인기검색어
CaO-Al<sub>2</sub>O<sub>3</sub>-SiO<sub>2</sub> 계 벌크 유리와 스프레이 코팅막의 CF<sub>4</sub>/O<sub>2</sub>/Ar 플라즈마 식각 시 내식성 비교 = Comparison of plasma resistance between spray coating films and bulk of CaO-Al<sub>2</sub>O<sub>3</sub>-SiO<sub>2</sub> glasses under CF<sub>4</sub>/O<sub>2</sub>/Ar plasma etching
한글로보기https://www.riss.kr/link?id=A106827161
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저자
나혜인 (한국세라믹기술원) ; 박제원 (한국세라믹기술원) ; 박재혁 (아이원스) ; 김대근 (아이원스) ; 최성철 (한양대학교) ; 김형준 (한국세라믹기술원) ; Na, Hyein ; Park, Jewon ; Park, Jae-Hyuk ; Kim, Dae-Gun ; Choi, Sung-Churl ; Kim, Hyeong-Jun
- 발행기관
- 학술지명
- 권호사항
-
발행연도
2020
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작성언어
Korean
- 주제어
-
등재정보
KCI등재,ESCI
-
자료형태
학술저널
- 발행기관 URL
-
수록면
66-72(7쪽)
- DOI식별코드
- 제공처
- 소장기관
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0
상세조회 -
0
다운로드
부가정보
다국어 초록 (Multilingual Abstract)
The difference of plasma resistance between the CAS glass bulk and coating films were compared. Plasma resistance was confirmed by analyzing the etch rate and the microstructure of the surface when the CAS glass bulk and the glass coating film were etched with CF<sub>4</sub>/O<sub>2</sub>/Ar plasma gas. CAS glass coating film was etched up to 25 times faster than the glass bulk. A statistically high correlation between the surface roughness and the etching rate of the coating film was derived, and thus, the high surface roughness of the coating film was determined to cause rapid etching. In addition, cristobalite crystals that has a low Ca content and a high Si content, was foamed on the glass coating film. Therefore, the CAS glass coating film is considered to have low plasma resistance compared to the glass bulk.
The difference of plasma resistance between the CAS glass bulk and coating films were compared. Plasma resistance was confirmed by analyzing the etch rate and the microstructure of the surface when the CAS glass bulk and the glass coating film were etched with CF<sub>4</sub>/O<sub>2</sub>/Ar plasma gas. CAS glass coating film was etched up to 25 times faster than the glass bulk. A statistically high correlation between the surface roughness and the etching rate of the coating film was derived, and thus, the high surface roughness of the coating film was determined to cause rapid etching. In addition, cristobalite crystals that has a low Ca content and a high Si content, was foamed on the glass coating film. Therefore, the CAS glass coating film is considered to have low plasma resistance compared to the glass bulk.
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- 한국결정성장학회
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