스퍼터로 성장된 알루미늄 박막의 공정 변수와 박막 두께에 따른 물성 = Film Properties of Al Thin Films Depending on Process Parameters and Film Thickness Grown by Sputter

다국어 초록 (Multilingual Abstract)

We developed an Al sputtering process by varying the plasma power, process temperature, and film thickness. We observed an increase of hillock distribution and average diameter with increasing plasma power, process temperature, and film thickness. Since the roughness of a film increases with the increase of the distribution and average size of hillocks, the control of hillock formation is a key factor in the reduction of Al corrosion. We observed the lowest hillock formation at 30 W and $100^{\circ}C$. This growth characteristic of sputtered Al thin films will be useful for the reduction of Al corrosion in the future of the electronic packaging field.

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