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      KCI등재 SCOPUS SCIE

      Electromigration in Molten-phase Ge2Sb2Te5 and Effects of Doping on Atomic Migration Rate

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      https://www.riss.kr/link?id=A104295474

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      다국어 초록 (Multilingual Abstract)

      Electromigration in molten Ge2Sb2Te5 (GST) was characterized using pulsed DC stress to an isolated line structure. When an electrical pulse was applied to the GST, GST lines were melted by Joule heating, and Ge and Sb atoms migrate to the cathode, whe...

      Electromigration in molten Ge2Sb2Te5 (GST) was characterized using pulsed DC stress to an isolated line structure. When an electrical pulse was applied to the GST, GST lines were melted by Joule heating, and Ge and Sb atoms migrate to the cathode, whereas Te atoms migrate to the anode. This elemental separation in the molten GST was caused by an electrostatic forceinduced electromigration. The effects of O-, N-, and Bi-doping on the electromigration were also investigated, and atomic mobility changes by the doping were investigated by quantifying DZ* values. The Bi -doping did not affect the DZ* values of the constituent atoms in the molten GST, but the DZ* values decreased by O-doping and N-doping.

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      참고문헌 (Reference)

      1 W. Welnic, "Unraveling the Interplay of Local Structure and Physical Properties in Phase-change Materials" 5 : 56-62, 2006

      2 한승민, "Thermomechanical properties and mechanical stresses of Ge2Sb2Te5 films in phase-change random access memory" ELSEVIER SCIENCE SA 517 (517): 848-852, 200811

      3 T. H. Jeong, "Study of Oxygen-doped GeSbTe Film and its Effect as an Interface Layer on the Recording Properties in the Blue Wavelength" 40 : 1609-1612, 2001

      4 N. Yamada, "Structure of Laser-crystallized Ge2Sb2+xTe5 Sputtered Thin Films for Use in Optical Memory" 88 : 7020-7028, 2000

      5 I. Friedrich, "Structural Transformations of Ge2Sb2Te5 Films Studied by Electrical Resistance Measurements" 87 : 4130-4134, 2000

      6 K. Shportko, "Resonant Bonding in Crystalline Phase-change Materials" 7 : 653-658, 2008

      7 K. Kim, "Reliability Investigations for Manufacturable High Density PRAM" 157-162, 2005

      8 R. Kojima, "Nitrogen Doping Effect on Phase Change Optical Disks" 37 : 2098-2103, 1998

      9 I.-M. Park, "Investigation of Crystallization Behaviors of Nitrogen-doped Ge2Sb2Te5 Films by Hermomechanical Characteristics" 94 : 061904-, 2009

      10 T.-Y. Yang, "Inhibition of the Electrostatic Force-induced Atomic Migration in Ge2Sb2Te5 by Nitrogen Doping" 13 : H321-H323, 2010

      1 W. Welnic, "Unraveling the Interplay of Local Structure and Physical Properties in Phase-change Materials" 5 : 56-62, 2006

      2 한승민, "Thermomechanical properties and mechanical stresses of Ge2Sb2Te5 films in phase-change random access memory" ELSEVIER SCIENCE SA 517 (517): 848-852, 200811

      3 T. H. Jeong, "Study of Oxygen-doped GeSbTe Film and its Effect as an Interface Layer on the Recording Properties in the Blue Wavelength" 40 : 1609-1612, 2001

      4 N. Yamada, "Structure of Laser-crystallized Ge2Sb2+xTe5 Sputtered Thin Films for Use in Optical Memory" 88 : 7020-7028, 2000

      5 I. Friedrich, "Structural Transformations of Ge2Sb2Te5 Films Studied by Electrical Resistance Measurements" 87 : 4130-4134, 2000

      6 K. Shportko, "Resonant Bonding in Crystalline Phase-change Materials" 7 : 653-658, 2008

      7 K. Kim, "Reliability Investigations for Manufacturable High Density PRAM" 157-162, 2005

      8 R. Kojima, "Nitrogen Doping Effect on Phase Change Optical Disks" 37 : 2098-2103, 1998

      9 I.-M. Park, "Investigation of Crystallization Behaviors of Nitrogen-doped Ge2Sb2Te5 Films by Hermomechanical Characteristics" 94 : 061904-, 2009

      10 T.-Y. Yang, "Inhibition of the Electrostatic Force-induced Atomic Migration in Ge2Sb2Te5 by Nitrogen Doping" 13 : H321-H323, 2010

      11 H. Kölpin, "Influence of Si and N Additions on Structure and Phase Stability of Ge2Sb2Te5 Thin Films" 21 (21): 435501-, 2009

      12 T.-Y. Yang, "Influence of Dopants on Atomic Migration and Void Formation in Molten Ge2Sb2Te5 under High-amplitude Electrical-pulse" 2012

      13 K. Wang, "Influence of Bi Doping upon the Phase Change Characteristics of Ge2Sb2Te5" 96 : 5557-5562, 2004

      14 A. Pirovano, "Electronic Switching in Phase-change Memories" 51 : 452-459, 2004

      15 S.-W. Nam, "Electric-field-induced Mass Movement of Ge2Sb2Te5 in Bottleneck Geometry Line Structures" 12 : H155-H159, 2009

      16 S. O. Ryu, "Crystallization behavior and physical properties of Sb-excess Ge2Sb2+xTe5 thin films for phase change memory (PCM) devices" ELECTROCHEMICAL SOC INC 153 : G234-G237, 2006

      17 R. M. Shelby, "Crystallization Dynamics of Nitrogen-doped Ge2Sb2Te5" 105 : 104902-, 2009

      18 T. H. Jeong, "Crystal Structure and Microstructure of Nitrogen-doped Ge2Sb2Te5 Thin Film" 39 : 2775-2779, 2000

      19 Y. Kim, "Changes in the Electronic Structures and Optical Band Gap of Ge2Sb2Te5 and N-doped Ge2Sb2Te5 during Phase Transition" 90 : 171920-, 2007

      20 T.-Y. Yang, "Atomic Migration in Molten and Crystalline Ge2Sb2Te5 under High Electric Field" 95 : 032104-, 2009

      21 R. Pearson, "Absolute Electronegativity and Hardness: Application to Inorganic Chemistry" 27 : 734-740, 1988

      22 E. Cho, "Ab Initio Study on Influence of Dopants on Crystalline and Amorphous Ge2Sb2Te5" 109 : 043705-, 2011

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