반도체 가공용 순수중의 불순물의 제어와 반도체 소자에 미치는 영향에 관한 연구 = On Control of Impurities in Pure Water and Effects of the Impurities on Semiconductor Elements for Assembly

다국어 초록 (Multilingual Abstract)

In this study, after discussing quality requirements of pure water for assembling semiconductor elements, seven model pure water manufacturing systems were made and examined the effects of bacteria and particles in the pure water on semiconductor elements for Assembly.
As the results, following conclusions were obtained.
1.Inserting UV sterilizer between cartridge polisher and ultrafiltration module, propagation of bacteria was minimized effectively.
2.Examining the effect of temperature on propagation of bacteria in pure water, it was turned out that the bacteria were propagated very rapidly between 26℃ and 33℃.
3.As the results of water pressure experiments, propagation of bacteria was surpressed by increasing water pressure almost near the specific pressure of membrane used.
4.Considering the influence of temperature and pressure on Propagation of bacteria in pure water, it is suggested that adoption of three loops through pretreatment step, make-up step and Polishing step respectively could fairly increase the purity of water.
5.It is found that particle count in each process was changed quite similarly to the change of bateria count through whole system by controlling the bacteria.

목차 (Table of Contents)

• 1.서 론
• 2.반도체 산업용 순수의 순도 및 제조기술의 발전
• 3.실험방법
• 3.1 사용약품
• 3.2 순수제조 시스템의 구성
• 3.3 박테리아 측정방법
• 3.4 미립자 측정 방법
• 4.결과 및 고찰
• 4.1 구성된 시스템에 따른 순수중의 박테리아
• 4.2 순수제조 공정상의 박테리아 함량의 변화
• 4.3 수온에 따른 웨이퍼 표면에서의 박테리아 오염상태
• 4.4 박테리아 번식에 주는 압력의 영향
• 4.5 시스템의 각 공정상에 있어서 미립자수의 변화
• 4.6 순수중의 박테리아와 미립자가 반도체소자 성능에 미치는 영향
• 5.결 론
• 참고문헌