클린룸 제조공정에서 수율개선을 위한 입자오염제어 방법 = Method of Particle Contamination Control for Yield Enhancement in the Cleanroom

참고문헌 (Reference)

1 "Yield Prediction Using Critical Area Analysis with Inline Defect Data" 82-86, 2002

2 "Yield Enhancement with Particle Defects Reduction Proceedings of IEEE International Workshop on Defect and Fault Tolerance in VLSI Systems" 246-253, 1994

3 "VOCs Contamination Control in the Cleanroom,The 6th Advanced Course for Cleanroom Technology," 245-264, 2006

4 "Total Contamination Control: The Minienvironment Era" 269-276, 1995

5 "Particle Count and Analysis by using a Cyclone Particle Count," 175-177, 1995

6 "Integrated Yield Management System using Critical Area Analysis," 233-236, 2005

7 "In-Line Defect Inspection From a Historical Perspective and Its Implications for Future Integrated Circuit Manufacturing IEEE Transactions on Semiconductor Manufacturing" 17 (17): 629-640, 2004

8 "Failure Modes and Effects Analysis of Flip Chip Devices Attached to Printed Wiring Boards (PWB)," 232-239, 1998

9 "Contamination Control using Production Test Data" 70-76, 1995

10 "Cleanroom Technology - Fundamentals of Design, Testing, and Operation" Johnson Wiley & Sons, England. 2001

11 "Cleanroom Contamination Control in the Semiconductor Device Manufacturing Process" 81-122, 2006

12 "Automating the Failure Modes and Effects Analysis of Safety Critical Systems" 310-311, 2004

13 "A Unified Approach to Failure Mode Proceedings of the Annual Reliability and Maintainability Symposium" 260-271, 1991

14 "A Trend of GIGA Level Cleanroom Technology" 17-62, 2002