<P>Monolayer graphene was deposited on a Si wafer substrate decorated with SiO<SUB>2</SUB> nanoparticles (NPs) and then exposed to aryl radicals that were generated <I>in situ</I> from their diazonium precursors. Using mi...
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https://www.riss.kr/link?id=A107684623
2013
-
SCOPUS,SCIE
학술저널
677-679(3쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
<P>Monolayer graphene was deposited on a Si wafer substrate decorated with SiO<SUB>2</SUB> nanoparticles (NPs) and then exposed to aryl radicals that were generated <I>in situ</I> from their diazonium precursors. Using mi...
<P>Monolayer graphene was deposited on a Si wafer substrate decorated with SiO<SUB>2</SUB> nanoparticles (NPs) and then exposed to aryl radicals that were generated <I>in situ</I> from their diazonium precursors. Using micro-Raman mapping, the aryl radicals were found to selectively react with the regions of graphene that covered the NPs. The enhanced chemical reactivity was attributed to the increased strain energy induced by the local mechanical deformation of the graphene.</P>
<P>Graphic Abstract</P><P>Due to the increased strain energy caused by local mechanical deformation, aryl radicals were found to selectively react with regions of graphene that were curved by underlying SiO<SUB>2</SUB> nanoparticles.
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