비정질 Sm - Fe계 합금 박막의 유도자기이방성 형성

다국어 초록 (Multilingual Abstract)

Induced anisotropy with the energy of 6×10⁴ J/㎥ is obtained in amorphous Sm-Fe based thin films which are fabricated by rf magnetron sputtering under a magnetic field of 500~600 Oe. Compared with conventional thin films, the anisotropic thin films exhibit a similar saturation magnetostriction, but show a very large anisotropy in magnetostriction which is of significant practical importance due to increased strain at a particular direction. It is shown from a systematic investigation over a wide composition range for binary Sm-Fe alloys that anisotropy is also induced, though small, during a normal sputtering procedure due to the stray field, and the largest anisotropy is observed in the composition range of 25~30 at.% Sm. Furthermore, induced anisotropy is also found to be formed by magnetic annealing, but the anisotropy energy is much smaller than that by magnetic sputtering. This may be because the volume diffusion by which atoms move during magnetic annealing to form induced anisotropy is much slower than the surface diffusion which is expected to be a dominant factor during magnetic sputtering.