폴리머 광도파로열을 이용한 파장 분할 다중화기의 제작|RISS 상세보기

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폴리머 광도파로열을 이용한 파장 분할 다중화기의 제작 = Fabrication of a wavelength division multiplexer based on the polymeric arrayed-waveguide grating

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https://www.riss.kr/link?id=A100584905

저자

오태원 ; 이원영 ; 신상영
발행기관
대한전자공학회
학술지명
전자공학회논문지D(Journal of the Institute of Electronics Engineers of Korea)
권호사항

Vol.d34 No.11 [1997]
발행연도
1997
작성언어
Korean
자료형태
학술저널
발행기관 URL
http://www.ieek.or.kr
수록면

70-75(6쪽)
제공처
ScienceON

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다국어 초록 (Multilingual Abstract)

a wavelength division multiplexer based on a polymeric arrayed-waveguide grating has been designed and fabricated. A 4-channel multiplexer with a spacing of 3.2 nm is designe dby using te 2-dimensional beam propagation method. A UV-curable epoxy, NOA73, is used for the core layer, and a passive polymer, PMMA, for the cladding layer. The polymer waveguides are fabricated by the reactive ion etching method and their optical properties are characterized. The fabricted device has a center wavelength of 1548.3 nm, and the wavelength spacing between the channels is 3.2nm. The measured crosstalk is better than -18dB.

번역하기

a wavelength division multiplexer based on a polymeric arrayed-waveguide grating has been designed and fabricated. A 4-channel multiplexer with a spacing of 3.2 nm is designe dby using te 2-dimensional beam propagation method. A UV-curable epoxy, NOA7...

a wavelength division multiplexer based on a polymeric arrayed-waveguide grating has been designed and fabricated. A 4-channel multiplexer with a spacing of 3.2 nm is designe dby using te 2-dimensional beam propagation method. A UV-curable epoxy, NOA73, is used for the core layer, and a passive polymer, PMMA, for the cladding layer. The polymer waveguides are fabricated by the reactive ion etching method and their optical properties are characterized. The fabricted device has a center wavelength of 1548.3 nm, and the wavelength spacing between the channels is 3.2nm. The measured crosstalk is better than -18dB.