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      다국어 초록 (Multilingual Abstract) kakao i 다국어 번역

      In focused ion beam (FIB) fabrication processes the ion beam intensity with Gaussian profile has a drawback for high resolution machining. In this paper, the fabrication method to modify the beam profile at substrate using silt mask is proposed to increase the machining resolution at high current. Slit mask is utilized to block the part of beam and transmit only high intensity portion. A nano manipulator is utilized to handle the silt mask. Geometrical analysis on fabricated profile through silt mask was conducted. By utilizing proposed method, improvement of machining resolution was achieved.
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      In focused ion beam (FIB) fabrication processes the ion beam intensity with Gaussian profile has a drawback for high resolution machining. In this paper, the fabrication method to modify the beam profile at substrate using silt mask is proposed to inc...

      In focused ion beam (FIB) fabrication processes the ion beam intensity with Gaussian profile has a drawback for high resolution machining. In this paper, the fabrication method to modify the beam profile at substrate using silt mask is proposed to increase the machining resolution at high current. Slit mask is utilized to block the part of beam and transmit only high intensity portion. A nano manipulator is utilized to handle the silt mask. Geometrical analysis on fabricated profile through silt mask was conducted. By utilizing proposed method, improvement of machining resolution was achieved.

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      참고문헌 (Reference)

      1 Kitslaara, P, "Towards the creation of quantum dots using FIB technology" 83 (83): 811-814, 2006

      2 Arshak, K, "The mechanism of the ion beam inhibited etching formation in Gallium-FIB implanted resist films" 78 (78): 39-46, 2005

      3 Lee, H. W, "Simulation of Focused Ion beam Processes for Micro-Nano Machining" 25 (25): 44-49, 2008

      4 Tseng,A.A, "Recent developments in micromilling using focused ion beam technology" 14 (14): R15-R34, 2004

      5 Han J, "Prediction of nanopattern topography using two-dimensional focused ion beam milling with beam irradiation intervals" 87 (87): 1-9, 2010

      6 Jack Zhou, "Nanohole Fabrication using FIB, EB and AFM for Biomedical Applications" 한국정밀공학회 7 (7): 18-22, 2006

      7 Han, J, "Microfabrication method using a combination of local ion implantation and magnetorheological finishing" 2 (2): 026503-, 2009

      8 Nakamatsua, K.-I, "Mechanical property evaluation of Au-coated nanospring fabricated by combination of focused-ion-beam chemical vapor deposition and sputter coating" 24 (24): 3169-3172, 2006

      9 Rauscher, M, "Limitations to low-voltage focused ion beam operation" 83 (83): 815-818, 2006

      10 Bischoff, L, "Focused ion beam sputtering investigations on SiC" 184 (184): 372-376, 2001

      1 Kitslaara, P, "Towards the creation of quantum dots using FIB technology" 83 (83): 811-814, 2006

      2 Arshak, K, "The mechanism of the ion beam inhibited etching formation in Gallium-FIB implanted resist films" 78 (78): 39-46, 2005

      3 Lee, H. W, "Simulation of Focused Ion beam Processes for Micro-Nano Machining" 25 (25): 44-49, 2008

      4 Tseng,A.A, "Recent developments in micromilling using focused ion beam technology" 14 (14): R15-R34, 2004

      5 Han J, "Prediction of nanopattern topography using two-dimensional focused ion beam milling with beam irradiation intervals" 87 (87): 1-9, 2010

      6 Jack Zhou, "Nanohole Fabrication using FIB, EB and AFM for Biomedical Applications" 한국정밀공학회 7 (7): 18-22, 2006

      7 Han, J, "Microfabrication method using a combination of local ion implantation and magnetorheological finishing" 2 (2): 026503-, 2009

      8 Nakamatsua, K.-I, "Mechanical property evaluation of Au-coated nanospring fabricated by combination of focused-ion-beam chemical vapor deposition and sputter coating" 24 (24): 3169-3172, 2006

      9 Rauscher, M, "Limitations to low-voltage focused ion beam operation" 83 (83): 815-818, 2006

      10 Bischoff, L, "Focused ion beam sputtering investigations on SiC" 184 (184): 372-376, 2001

      11 Volkert, C. A, "Focused ion beam microscopy and micromachining" 32 (32): 389-395, 2007

      12 Kang, E. G, "FIB Sputtering Process Technology and Its Application" 25 (25): 23-31, 2008

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2013-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2010-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2008-06-23 학회명변경 영문명 : Korean Society Of Precision Engineering -> Korean Society for Precision Engineering KCI등재
      2008-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2006-07-07 학술지명변경 외국어명 : 미등록 -> Journal of the Korean Society for Precision Engineering KCI등재
      2006-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2004-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2001-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      1998-07-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.26 0.26 0.26
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.24 0.22 0.449 0.12
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