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      KCI등재 SCOPUS SCIE

      나노 적층 구조를 응용한 저항성 기반 비휘발성 메모리 소자 특성 제어 = Control of Charge Transports in Nonvolatile Resistive Memory Devices through Embedded Nanoscale Layers

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      https://www.riss.kr/link?id=A105209267

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      다국어 초록 (Multilingual Abstract)

      Nickel oxide thin films exhibit the resistive switching as a function of applied voltages. The switching phenomena involve low and high resistance states after electroforming. The electrical features are believed to be associated with the formation and rupture of filaments. The set and reset behaviors are controlled by the oxidation and reduction of filaments. The indirect evidence of filaments is corroborated by the presence of nanocrystalline nickel oxides found in high-resolution transmission electron microscopy. The insertion of insulating layers seems to control the current-voltage characteristics by preventing the continuous formation of conductive filaments, potentially leading to artificial control of resistive behaviors in NiO-based systems.
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      Nickel oxide thin films exhibit the resistive switching as a function of applied voltages. The switching phenomena involve low and high resistance states after electroforming. The electrical features are believed to be associated with the formation an...

      Nickel oxide thin films exhibit the resistive switching as a function of applied voltages. The switching phenomena involve low and high resistance states after electroforming. The electrical features are believed to be associated with the formation and rupture of filaments. The set and reset behaviors are controlled by the oxidation and reduction of filaments. The indirect evidence of filaments is corroborated by the presence of nanocrystalline nickel oxides found in high-resolution transmission electron microscopy. The insertion of insulating layers seems to control the current-voltage characteristics by preventing the continuous formation of conductive filaments, potentially leading to artificial control of resistive behaviors in NiO-based systems.

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      참고문헌 (Reference)

      1 K. S. Kim, "X-ray Photoelectron Spectroscopic Studies of Nickel-oxygen Surfaces Using Oxygen and Argon Ion Bombardment" 43 : 625-643, 1974

      2 C. -C. Hung, "Wide Operation Margin of Toggle Mode Switching for Magnetic RandomAccess Memory with Preceding Negative Pulse WritingScheme" 88 (88): 2006

      3 J. F. Gibbons, "Switching Properties of tHin Nickel Oxide Films" 7 : 785-797, 1964

      4 D. Choi, "Reversible Resistive Switching of SrTiOx Thin Films for Nonvolatile Memory Applications" 88 (88): 2006

      5 A. Beck, "Reproducible Switching Effect in Thin Oxide Films for Memory Applications" 77 : 139-141, 2000

      6 S. -Y Lee, "Polycrystalline Silicon-germanium Heating Layer for Phasechange Memory Applications" 89 (89): 2006

      7 D. Ma, "Organic Reversible Switching Devices for Memory Applications" 12 : 1063-1066, 2000

      8 C. Lee, "Nonvolatile Memory With a Metal Nanocrystal/Nitride Heterogeneous Floating-Gate" 52 : 2697-2702, 2005

      9 C. Papagianni, "Impedance Study of Reproducible Switching Memory Effect" 125-128, 2004

      10 C. Rohde, "Identification of a Determining Parameter for Resistive Switching of TiO2 Thin Films" 86 (86): 2005

      1 K. S. Kim, "X-ray Photoelectron Spectroscopic Studies of Nickel-oxygen Surfaces Using Oxygen and Argon Ion Bombardment" 43 : 625-643, 1974

      2 C. -C. Hung, "Wide Operation Margin of Toggle Mode Switching for Magnetic RandomAccess Memory with Preceding Negative Pulse WritingScheme" 88 (88): 2006

      3 J. F. Gibbons, "Switching Properties of tHin Nickel Oxide Films" 7 : 785-797, 1964

      4 D. Choi, "Reversible Resistive Switching of SrTiOx Thin Films for Nonvolatile Memory Applications" 88 (88): 2006

      5 A. Beck, "Reproducible Switching Effect in Thin Oxide Films for Memory Applications" 77 : 139-141, 2000

      6 S. -Y Lee, "Polycrystalline Silicon-germanium Heating Layer for Phasechange Memory Applications" 89 (89): 2006

      7 D. Ma, "Organic Reversible Switching Devices for Memory Applications" 12 : 1063-1066, 2000

      8 C. Lee, "Nonvolatile Memory With a Metal Nanocrystal/Nitride Heterogeneous Floating-Gate" 52 : 2697-2702, 2005

      9 C. Papagianni, "Impedance Study of Reproducible Switching Memory Effect" 125-128, 2004

      10 C. Rohde, "Identification of a Determining Parameter for Resistive Switching of TiO2 Thin Films" 86 (86): 2005

      11 S. Seo, "Electrode Dependence of Resistance Switching in Polycrystalline NiO Films" 87 (87): 2005

      12 G. Dearnaley, "Electrical Phenomena in Oxide Films" 33 : 1129-1191, 1970

      13 J.-K. Kang, "Chemical Vapor Deposition of Nickel Oxide Films From Ni(C5H5) /O2" 391 : 57-61, 2001

      14 W. R. Hiatt, "Bistable Switching in Niobium Oxide Diodes" 6 : 106-, 1965

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2010-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2008-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2006-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2004-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2001-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      1998-07-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.16 0.16 0.17
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.16 0.16 0.331 0.06
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