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이 학술지의 논문 검색
Advanced Dielectric Etching with a High Density Plasma Tool: Issues and Challenges in Manufacturing
Cook, J. M. IEEE 1995 p.1
Implementation of CMP-based Design Rules and Patterning Practices
Camilletti, L. E. IEEE 1995 p.2-4
Rapid Thermal Processing (RTP) Applied to Ion Implant Anneal for 0.25� Technology
Hossain, S. D.;Pas, M. F.;Cleavelin, C. R.;Miner, G. IEEE 1995 p.5-7
Manufacturability Improvement of Inductively Coupled Plasma Etch Chambers in PVD Tools
Berti, A. C.;Bonner, E. A. IEEE 1995 p.8-12
A Novel, Borderless Metal-to-Diffusion Contact Technique
Gallagher, M.;Ebel, C.;MacDougall, G.;Weeks, T. IEEE 1995 p.13-15
Advancements in Wafer Finishing Manufacturing Technology Involving Plating
Lowry, K.;VanHorn, C.;Shawhan, G. IEEE 1995 p.16
ISPM Characterization of Gas Phase Nucleation in a Novellus C1 WCVD Process Chamber
Winter, T.;Colston, D.;Mickler, E.;Woodward, R. IEEE 1995 p.17-22
Plasma Etch Tool Selection Criteria for Minimizing Cost of Ownership
Mautz, K.;Bloom, R. IEEE 1995 p.29-31