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      KCI등재

      고정밀 머신 비전을 위한 정확한 PCB 윤곽선과 코너 검출 = Accurate PCB out line extraction and corner detection for high precision machine vision

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      https://www.riss.kr/link?id=A105103512

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      다국어 초록 (Multilingual Abstract)

      Recently, Advances in technology have increased the importance of visual inspection in semiconductor inspection areas. In PCB visual inspection, the accuracy of the line estimation used in the preceding calibration, alignment, etc., is critical to the accuracy of the entire instrument. We propose line estimation that is differently weighted for the line candidates using a histogram of gradient information, when the position of the initial approximate corner points were known. Using the obtained line equation of the outline, we can detect the accurate corner points in the picture. The corner points by the proposed method are compared with the existing method. The proposed method accurately detect corner in the situation when the existing methods have problem such as overlap, misdetection, etc. In high-resolution frame of 3.5mega-pixels, the proposed method operates at a speed of 89.01ms which can be processed in the real-time.
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      Recently, Advances in technology have increased the importance of visual inspection in semiconductor inspection areas. In PCB visual inspection, the accuracy of the line estimation used in the preceding calibration, alignment, etc., is critical to the...

      Recently, Advances in technology have increased the importance of visual inspection in semiconductor inspection areas. In PCB visual inspection, the accuracy of the line estimation used in the preceding calibration, alignment, etc., is critical to the accuracy of the entire instrument. We propose line estimation that is differently weighted for the line candidates using a histogram of gradient information, when the position of the initial approximate corner points were known. Using the obtained line equation of the outline, we can detect the accurate corner points in the picture. The corner points by the proposed method are compared with the existing method. The proposed method accurately detect corner in the situation when the existing methods have problem such as overlap, misdetection, etc. In high-resolution frame of 3.5mega-pixels, the proposed method operates at a speed of 89.01ms which can be processed in the real-time.

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      참고문헌 (Reference)

      1 Duda, R., "Use of the Hough Trans-formation to Detect Lines and Curves in Pictures" 1972

      2 Choi, K.-S., "Real-time Inspection System for Printed Circuit Boards" 2781 : 458-465, 2003

      3 Tsai, D. M., "Micro-crack Inspection in Heterogeneously Textured Solar Wafers Using Anisotropic Diffusion" 28 : 491-501, 2010

      4 Berng, D.-B., "Auto-mated Bonding Position Inspection of Multi-layered Wire IC Using Machine Vision" 48 (48): 2010

      5 Harris, C., "A Combined Corner and Edge Detector" 1988

      1 Duda, R., "Use of the Hough Trans-formation to Detect Lines and Curves in Pictures" 1972

      2 Choi, K.-S., "Real-time Inspection System for Printed Circuit Boards" 2781 : 458-465, 2003

      3 Tsai, D. M., "Micro-crack Inspection in Heterogeneously Textured Solar Wafers Using Anisotropic Diffusion" 28 : 491-501, 2010

      4 Berng, D.-B., "Auto-mated Bonding Position Inspection of Multi-layered Wire IC Using Machine Vision" 48 (48): 2010

      5 Harris, C., "A Combined Corner and Edge Detector" 1988

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2027 평가예정 재인증평가 신청대상 (재인증)
      2021-01-01 평가 등재학술지 유지 (재인증) KCI등재
      2019-01-01 평가 등재학술지 유지 (계속평가) KCI등재
      2016-01-01 평가 등재학술지 유지 (계속평가) KCI등재
      2012-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2010-03-25 학회명변경 한글명 : 한국반도체및디스플레이장비학회 -> 한국반도체디스플레이기술학회
      영문명 : The Korean Society of Semiconductor & Display Equipment Technology -> The Korean Society of Semiconductor & Display Technology
      KCI등재
      2010-03-25 학술지명변경 한글명 : 반도체및디스플레이장비학회지 -> 반도체디스플레이기술학회지
      외국어명 : Journal of the Semiconductor and Display Equipment Technology -> Journal of the Semiconductor & Display Technology
      KCI등재
      2009-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2008-01-01 평가 등재후보 1차 PASS (등재후보1차) KCI등재후보
      2006-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.29 0.29 0.26
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.21 0.18 0.217 0.02
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