Ni-Gd doped Ceria (GDC) cermet is a widely used anode material in the field of thin-film solid oxide fuel cells (TF-SOFC). When Ni-GDC cermet anode is fabricated as thin film by deposition methods such as sputtering and pulsed laser deposition, a suff...
Ni-Gd doped Ceria (GDC) cermet is a widely used anode material in the field of thin-film solid oxide fuel cells (TF-SOFC). When Ni-GDC cermet anode is fabricated as thin film by deposition methods such as sputtering and pulsed laser deposition, a sufficient amount of GDC is necessary as high composition of ceramic materials, typically less mobile than metals, can suppress thermal agglomeration of metals by inhibiting its mass transport. However, achieving such GDC composition is difficult using the co-sputtering method since ceramic targets exhibit considerably lower sputtering yield compared to metal targets. This is also in part due to the inherent limitation of the sputtering technique as high electrical power cannot be applied to ceramic targets. In this study, Ni-GDC anode with GDC composition of more than 20% was fabricated by co-sputtering Ni target and GDC ceramic target and controlling the glancing angle. Rotation of the substrate was suppressed to obtain uneven incident angles of Ni and GDC vapor. As a result, Ni deposition rate was reduced by half while GDC deposition rate was maintained. Electrochemical examination of the TF-SOFC utilizing the as-fabricated anode was done via methods such as EIS and LSV at 600℃.