공정 조건에 따른 비정질 탄소막 표면 물성분석 = Surface Properties of ACL Thin Films Depending on Process Conditions

다국어 초록 (Multilingual Abstract)

Amorphous carbon layer (ACL) is actively used as an etch mask. Recent advances in patterning ACL requires the next level of durability of hard mask in high aspect ratio etch in near future semiconductor manufacturing, and it is worthwhile to know the surface property of ACL thin film to enhance the property of etch hard mask. In this research, ACL are deposited by 6 inch plasma enhanced chemical vapor deposition system with C3H6 and N2 gas mixture.
Surface properties of deposited ACL are investigated depending on gas flow, pressure, RF power. Fourier transform infrared is used for the analysis of surface chemistry, and X-ray photoemission spectra is used for the structural analysis with the consideration of the contents of sp2 and sp3 through fitting of C1s. Also mechanical properties of deposited ACL are measured in order to evaluate hardness.

참고문헌 (Reference)

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