Although the megasonic cleaning is widely employed to remove particles sitting on photomasks and wafers in semiconductor industry, the understanding of the cleaning mechanism is far from complete yet. In general, acoustic streaming and cavitation take...
Although the megasonic cleaning is widely employed to remove particles sitting on photomasks and wafers in semiconductor industry, the understanding of the cleaning mechanism is far from complete yet. In general, acoustic streaming and cavitation take place when megasonic vibration is imposed on cleaning medium. As the first step to understand the physical effect of such flow behavior on cleaning process, here we focus on the experimental quantification of the acoustic streaming flow. We present a method to measure the acoustic power generated by megasonic transducers using thermoelectric probes. Then we compare the theoretically predicted acoustic streaming velocity with that obtained by the particle image velocimetry (PIV). Correlation of the acoustic streaming flow pattern with spatial distribution of the particle removal efficiency is expected to reveal the degree of acoustic streaming effect on the particle removal process.