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      KCI등재 SCI SCIE SCOPUS

      Improvement of Soft Magnetic Properties of CoFeSiB Thin Film by External Magnetic Field and Zr Addition

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      https://www.riss.kr/link?id=A104265037

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      다국어 초록 (Multilingual Abstract)

      Co40Fe17Si32B11 thin film (150 nm) was deposited by using an RF magnetron co-sputtering system on a Si (100) substrate. A self-designed substrate holder, including various hard magnets arranged around the sub-strates, was utilized so that various external magnetic fields could be applied to the Si substrates during the film deposition. By the effect of this deposition field, the applied field during the sample deposition, the squareness of the CoFeSiB thin film was significantly enhanced. From the angular analysis of the mag-netic hysteresis curves from easy (parallel to external magnetic field) to hard (perpendicular to external magnetic field) direction of magnetization, it can be deduced that Co and Fe atoms were magnetically arranged to the easy magnetization axis by an external magnetic field which was induced during deposition.
      Also, the compositional cluster size of the CoFeSiB thin film was remarkably reduced by Zr addition,causing a decrease in the value of coercivity. These results suggest that apparent magnetic anisotropy was achieved, and the soft magnetic property of the CoFeSiB thin film was remarkably enhanced by the com-bination of the deposition field and Zr addition.
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      Co40Fe17Si32B11 thin film (150 nm) was deposited by using an RF magnetron co-sputtering system on a Si (100) substrate. A self-designed substrate holder, including various hard magnets arranged around the sub-strates, was utilized so that various exte...

      Co40Fe17Si32B11 thin film (150 nm) was deposited by using an RF magnetron co-sputtering system on a Si (100) substrate. A self-designed substrate holder, including various hard magnets arranged around the sub-strates, was utilized so that various external magnetic fields could be applied to the Si substrates during the film deposition. By the effect of this deposition field, the applied field during the sample deposition, the squareness of the CoFeSiB thin film was significantly enhanced. From the angular analysis of the mag-netic hysteresis curves from easy (parallel to external magnetic field) to hard (perpendicular to external magnetic field) direction of magnetization, it can be deduced that Co and Fe atoms were magnetically arranged to the easy magnetization axis by an external magnetic field which was induced during deposition.
      Also, the compositional cluster size of the CoFeSiB thin film was remarkably reduced by Zr addition,causing a decrease in the value of coercivity. These results suggest that apparent magnetic anisotropy was achieved, and the soft magnetic property of the CoFeSiB thin film was remarkably enhanced by the com-bination of the deposition field and Zr addition.

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      참고문헌 (Reference)

      1 Y. K. Kim, 304 : 79-, 2006

      2 K. Msellak, 281 : 295-, 2004

      3 H. K. Kim, 204 : 4104-, 2007

      4 P. Yang, 83 : 1376-, 2009

      5 V. I. Malyutin, 65 : 45-, 1981

      6 O. Devos, 145 : 401-, 1998

      7 H. Matsuskina, 7 : 81-, 2004

      8 I. Tabakovic, 150 : C635-, 2003

      9 G. Herzer, 26 : 1397-, 1990

      10 S. Chikazumi, 5 : 333-, 1950

      1 Y. K. Kim, 304 : 79-, 2006

      2 K. Msellak, 281 : 295-, 2004

      3 H. K. Kim, 204 : 4104-, 2007

      4 P. Yang, 83 : 1376-, 2009

      5 V. I. Malyutin, 65 : 45-, 1981

      6 O. Devos, 145 : 401-, 1998

      7 H. Matsuskina, 7 : 81-, 2004

      8 I. Tabakovic, 150 : C635-, 2003

      9 G. Herzer, 26 : 1397-, 1990

      10 S. Chikazumi, 5 : 333-, 1950

      11 안현태, "스퍼터링 중 외부자기장이 자성박막의 자기적 특성에 미치는 영향" 대한금속·재료학회 49 (49): 505-513, 2011

      12 H. Kronmuller, "Handbook of Magnetism and Advanced Magnetic Materials" Novel Materials 1893-, 2007

      13 J. Y. Bae, "Compositional Change of MgO Barrier and Interface in CoFeB/MgO/CoFeB Tunnel Junction after Annealing" 한국자기학회 11 (11): 25-29, 2006

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2009-12-29 학회명변경 한글명 : 대한금속ㆍ재료학회 -> 대한금속·재료학회 KCI등재
      2008-01-01 평가 SCI 등재 (등재유지) KCI등재
      2005-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2004-01-01 평가 등재후보 1차 PASS (등재후보1차) KCI등재후보
      2002-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 2.05 0.91 1.31
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      1.03 0.86 0.678 0.22
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