Here, band gap-tunable oxygen-doped graphitic carbon nitride (g-C3N4) with outstanding “two-channel” photocatalytic H2O2 production ability was prepared via hydrothermal treatment assisted by dissolution–precipitation process. XRD, N2 adsorption...
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https://www.riss.kr/link?id=A106064045
Hui Wang (Liaoning Shihua University) ; Yuanhao Guan (Liaoning Shihua University) ; Shaozheng Hu (Liaoning Shihua University) ; Yanbo Pei (Liaoning Shihua University) ; Wentao Ma (Liaoning Shihua University) ; Zhiping Fan (Liaoning Shihua University)
2019
English
KCI등재,SCOPUS,SCIE
학술저널
99-110(12쪽)
2
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
Here, band gap-tunable oxygen-doped graphitic carbon nitride (g-C3N4) with outstanding “two-channel” photocatalytic H2O2 production ability was prepared via hydrothermal treatment assisted by dissolution–precipitation process. XRD, N2 adsorption...
Here, band gap-tunable oxygen-doped graphitic carbon nitride (g-C3N4) with outstanding “two-channel” photocatalytic H2O2 production ability was prepared via hydrothermal treatment assisted by dissolution–precipitation process. XRD, N2 adsorption, UV–Vis, Fourier-transform infrared spectra, SEM, electrochemical impedance spectra, XPS and photoluminescence were used to characterize the obtained catalysts. The photocatalytic H2O2 production ability of as-prepared catalyst was investigated. The results show that oxygen doping not only changes the morphology of catalyst, decreases the band gap energy and promotes the separation efficiency of photogenerated electrons and holes, but also tunes the CB and VB potentials. As-prepared oxygen-doped g-C3N4 displays a H2O2 concentration of 3.8 mmol L -1, more than 7.6 times higher than that of neat g-C3N4. Because of the shift of CB and VB potentials, not only the CB electrons of oxygen-doped g-C3N4 reduce O2 to form H2O2, but also the VB holes can oxidize OH- to form OH, which subsequently react with each other to form H2O2. Such “two-channel pathway” causes the remarkably promoted H2O2 production ability.
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학술지 이력
연월일 | 이력구분 | 이력상세 | 등재구분 |
---|---|---|---|
2021 | 평가예정 | 해외DB학술지평가 신청대상 (해외등재 학술지 평가) | |
2020-12-01 | 평가 | 등재 탈락 (해외등재 학술지 평가) | |
2013-10-01 | 평가 | 등재학술지 선정 (기타) | |
2008-01-01 | 평가 | SCIE 등재 (신규평가) |
학술지 인용정보
기준연도 | WOS-KCI 통합IF(2년) | KCIF(2년) | KCIF(3년) |
---|---|---|---|
2016 | 0.63 | 0.14 | 0.51 |
KCIF(4년) | KCIF(5년) | 중심성지수(3년) | 즉시성지수 |
0.45 | 0.39 | 0.176 | 0.05 |