TEOS-TMB-H2O 계로부터 SiO2-B2O3 막제조에 관한 연구 = Preparation of Microporous SiO2-B2O3 Membrane from TEOS-TMB-H2O System

국문 초록 (Abstract)

다공성 SiO_2-B_2O_3 막을 졸겔법에 의해서 Si(OC_2H_5)_4-(CH_3O)_3B-H_2O-C_2H_5OH 계로부터 제조하고 막의 특성을 XRD, IR, BET, TG-DTA, SEM, TEM을 사용하여 조사하였다. 괴상의 다공성 SiO_2-B_2O_3 막 제조를 위한 Si(OC_2H_5)_4 : (CH_3O)_3B : H_2O : C_2H_5OH의 최적 몰비는 1:0.11:5.385:5.385 이었다. Si(OH_4)와 B(OH)_3는 400℃ 이하에서 생성되고 SiO_2-B_2O_3는 500℃ 이상에서 생성되었다. 25 ℃~800 ℃ 온도범위에서 얻어진 건조 겔체는 평균 기공직경이 0.0034 ㎛~0.0052㎛이고 표면적은 244.478 ㎡/g~648.138 ㎡/g이었으며, 입자의 크기는 7㎚~35㎚인 무정형의 다공체이었다.

다국어 초록 (Multilingual Abstract)

A porous borosilicate membrane was prepared from Si(OC_2H_5)_4-(CH_2O)_3B-H_2O-C_2H_5OH system by sol-gel method. In order to investigate the characteristics of this membrane, the analytical methods such as X-ray diffractometer, IR spectrophotometer, BET, TG-DTA, SEM and TEM have been utilized, for porous borosilicate membrane, the optimum mole ratio of Si(OC_2H_5)_4 : (CH_3O)_3B : H_2O : C_2H_5OH was 1:0.11:5.385:5.385. Most of borons in the gels dried at room temperature were considered to be of boric acid forms, since they were hydrogen bonded to the silica network. In the 100 ℃~500 ℃ range, however, some of the boric acids were condensed with the silica frame work to form terminal =B-O-Si≡. Above 500 ℃, the condensation proceeded further and boron was fully incorporated into the frame work of =B-O-Si≡. Therefore, the porous borosilicate membrane was obtained by the heat treatment of the gel above 500 ℃. In the 25 ℃~800 ℃ range, the surface area of sintered gel was between 244.478 ㎡/g~648.138㎡/g; the median pore diameter was between 0.0034 ㎛~0.0052 ㎛; and the particle size of sintered gel was between 7㎚ ~35 ㎚.