Naphthoquinone diazide derivatives members of quinone diazide compound that are utihizable as photosensitve polymer material were synthesized, and photoresist were prepared by mixing these derivatives with a matrix resm at various weight ratios.
Phot...
Naphthoquinone diazide derivatives members of quinone diazide compound that are utihizable as photosensitve polymer material were synthesized, and photoresist were prepared by mixing these derivatives with a matrix resm at various weight ratios.
Photosensitive characteristics of photoresist were studied by examining UV and IR, relative sensitivity using a Gray scale method, and SEM to analyze if they can be used as photosensitive material in printing process
Experimental results showed that, by UV, NQD derivatives were photo-converted and developer-soluble photoresist were produced. The mixing ratio of 1 4(by mass) of NQD+ballas : and m-cresol novolak gave nse to the highest dissolution rate.
In addition, photoresist obtained at this condition resulted in the most superior sensitivity and contrast