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      Polyurethane triblock copolymer gate dielectrics for low-voltage organic thin-film transistors

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      https://www.riss.kr/link?id=A107464576

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      <P><B>Abstract</B></P> <P>Novel polyurethane triblock copolymers comprising polycaprolactone diol (PCL), 1,6-hexamethylene diisocyanate (HMDI), and polyethylene glycol (PEG) were synthesized for use as gate dielectric for organic thin-film transistors (OTFTs). Thin films of polyurethane gate dielectrics processed from solution exhibit excellent insulating properties (∼7×10<SUP>−7</SUP> A/cm<SUP>2</SUP> at 1V) as well as large areal capacitance (170nF/cm<SUP>2</SUP>) with film thickness of ∼50nm. OTFTs are fabricated with representative n-channel organic semiconductor (N,N′-ditridecylperylene-3,4,9,10-tetracarboxylic diimide; PTCDI-C13) using the developed gate dielectrics, and the resulting devices show decent electrical performance with negligible hysteresis at low operating voltage of 1V.</P>
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      <P><B>Abstract</B></P> <P>Novel polyurethane triblock copolymers comprising polycaprolactone diol (PCL), 1,6-hexamethylene diisocyanate (HMDI), and polyethylene glycol (PEG) were synthesized for use as gate dielectric fo...

      <P><B>Abstract</B></P> <P>Novel polyurethane triblock copolymers comprising polycaprolactone diol (PCL), 1,6-hexamethylene diisocyanate (HMDI), and polyethylene glycol (PEG) were synthesized for use as gate dielectric for organic thin-film transistors (OTFTs). Thin films of polyurethane gate dielectrics processed from solution exhibit excellent insulating properties (∼7×10<SUP>−7</SUP> A/cm<SUP>2</SUP> at 1V) as well as large areal capacitance (170nF/cm<SUP>2</SUP>) with film thickness of ∼50nm. OTFTs are fabricated with representative n-channel organic semiconductor (N,N′-ditridecylperylene-3,4,9,10-tetracarboxylic diimide; PTCDI-C13) using the developed gate dielectrics, and the resulting devices show decent electrical performance with negligible hysteresis at low operating voltage of 1V.</P>

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