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      KCI등재후보 SCIE

      Molecular Dynamics Simulation for Size- Dependent Propertics and Various Nanoscale Phenomena

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      https://www.riss.kr/link?id=A104296535

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      다국어 초록 (Multilingual Abstract) kakao i 다국어 번역

      Stimulated by novel phenomena observed in molecular aggregates, recent developments in engineering fields of microscopic scales are creating tremendous opportunities for future nanotechnology-based applications. Investigation in the field involves sub-nanosecond or sub-micrometer interactions between extremely small systems, but researches to date in these physical extremes have been quite limited. Here, we shed light on some of nanoscale phenomena using molecular dynamics simulation: visualization of various phenomena of nanoscales and exploration of size-dependent mechanical properties.
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      Stimulated by novel phenomena observed in molecular aggregates, recent developments in engineering fields of microscopic scales are creating tremendous opportunities for future nanotechnology-based applications. Investigation in the field involves sub...

      Stimulated by novel phenomena observed in molecular aggregates, recent developments in engineering fields of microscopic scales are creating tremendous opportunities for future nanotechnology-based applications. Investigation in the field involves sub-nanosecond or sub-micrometer interactions between extremely small systems, but researches to date in these physical extremes have been quite limited. Here, we shed light on some of nanoscale phenomena using molecular dynamics simulation: visualization of various phenomena of nanoscales and exploration of size-dependent mechanical properties.

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      참고문헌 (Reference)

      1 Tersoff,, "New Empirical Approach for the Structure and Energy of Covalent Systems" 37 (37): 6991-7000, 1988.

      2 Weng, "Molecular Dynamics Investigation of Thickness Effect on Liquid Films" 113 : 5917-5923, 2000.

      3 Diaz-Herrera,, "Interfacial Tension Behavior of Binary and Ternary Mixtures of Partially Miscible Lennard-Jones Fluids" 110 : 8084-8089, 1999.

      4 Park, "Heterogeneous Crystallization of Amorphous Silicon Expedited by External Force Fields"

      5 Ishimaru,, "Generation of Amorphous Silicon Structures by Rapid Quenching" 56 : 15133-15138, 1997.

      6 Tersoff,, "Empirical Interatomic Potential for Silicon with Improved Elastic Properties" 38 (38): 9902-9905, 1988.

      7 Tu, "Electronic Thin Film Science for Electrical Engineers and Material Scientist" Macmillan 1992.

      8 Park, "Cavitation and Bubble Nucleation Using Molecular Dynamics Simulation" 4 : 161-175, 2000.

      9 Ercolessi,, "A olecular Dynamics Primer" 2-3, 1997.

      10 Park, "A Molecular Dynamics Study on Surface Tension of Microbubbles" 44 : 1849-1856, 2001.

      1 Tersoff,, "New Empirical Approach for the Structure and Energy of Covalent Systems" 37 (37): 6991-7000, 1988.

      2 Weng, "Molecular Dynamics Investigation of Thickness Effect on Liquid Films" 113 : 5917-5923, 2000.

      3 Diaz-Herrera,, "Interfacial Tension Behavior of Binary and Ternary Mixtures of Partially Miscible Lennard-Jones Fluids" 110 : 8084-8089, 1999.

      4 Park, "Heterogeneous Crystallization of Amorphous Silicon Expedited by External Force Fields"

      5 Ishimaru,, "Generation of Amorphous Silicon Structures by Rapid Quenching" 56 : 15133-15138, 1997.

      6 Tersoff,, "Empirical Interatomic Potential for Silicon with Improved Elastic Properties" 38 (38): 9902-9905, 1988.

      7 Tu, "Electronic Thin Film Science for Electrical Engineers and Material Scientist" Macmillan 1992.

      8 Park, "Cavitation and Bubble Nucleation Using Molecular Dynamics Simulation" 4 : 161-175, 2000.

      9 Ercolessi,, "A olecular Dynamics Primer" 2-3, 1997.

      10 Park, "A Molecular Dynamics Study on Surface Tension of Microbubbles" 44 : 1849-1856, 2001.

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2011-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2009-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2008-06-23 학회명변경 영문명 : Korean Society Of Precision Engineering -> Korean Society for Precision Engineering KCI등재
      2006-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2005-05-30 학술지명변경 한글명 : 한국정밀공학회 영문논문집 -> International Journal of the Korean of Precision Engineering KCI등재후보
      2005-05-30 학술지명변경 한글명 : International Journal of the Korean of Precision Engineering -> International Journal of Precision Engineering and Manufacturing
      외국어명 : International Journal of the Korean of Precision Engineering -> International Journal of Precision Engineering and Manufacturing
      KCI등재후보
      2005-01-01 평가 등재후보 1차 PASS (등재후보1차) KCI등재후보
      2003-07-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 1.38 0.71 1.08
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.92 0.85 0.583 0.11
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